At present, there are two preparation methods of high entropy alloy sputtering targets: mainly special melting and powder metallurgy.
Special smelting method
A certain proportion of alloy raw materials smelting, and then the alloy liquid into the mold, form an ingot, and then through mechanical processing into a target material, cast under vacuum. Commonly used smelting methods include vacuum induction melting, vacuum arc melting and vacuum electron bombardment melting, etc. The advantages are low impurity content, high density, and large size; the disadvantages are: two or more melting points and density differences of the target material are large, and it is difficult to obtain the alloy target with uniform components.
Powder metallurgy method
According to a certain proportion of alloy raw material smelting, poured into ingot after crushing, and other static pressure formation, and then high-temperature sintering, and finally form the target material, the advantage is that the target material composition is uniform, the disadvantage is the low density, high impurity content, commonly used powder metallurgy methods have cold pressure, vacuum thermal pressure, thermal pressure, and other static pressure powder metallurgy.
The manufacturing process of high entropy alloy target materials: using metal smelting, metal metallurgy, non-metal powder method, using vacuum melting, ordinary heat pressure, cold pressure sintering, after forging, heat rolling, to eliminate profile stress, uniform or uniform sintering, or through high-temperature sintering to improve its tightness, and then a vehicle, milling, grinding, grinding, then cleaning, drying, and finally make finished products. Sometimes, anaerobic copper backplates can be fixed as required after certain targets have been metallicized by the surface. Finally, the ultrasound or X-ray inspection, packaging, and factory inspection were passed.