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Heeger Materials offers a wide range of high purity sputtering targets included pure metal and alloy targets; oxides, fluorides, and nitrides targets, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
Heeger Materials (HM) will contact you with the price and availability of these items in ...
Heeger Materials offers a wide range of high purity sputtering targets included pure metal and alloy targets; oxides, fluorides, and nitrides targets, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
Heeger Materials (HM) will contact you with the price and availability of these items in 24 hours.
Sputtering Targets There are 339 products.
Aluminum (Al) Sputtering Target
Aluminum (Al) Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. HM specializes in producing high purity Aluminum (Al) Sputtering Target with the highest possible density and the lowest prices.
$189.06In StockAntimony (Sb) Sputtering Target
Antimony (Sb) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Antimony (Sb) Sputtering Target with the highest possible density and the lowest prices.
$433.66In StockCadmium (Cd) Sputtering Target
Cadmium (Cd) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Cadmium (Cd) Sputtering Target with the highest possible density and the lowest prices.
$231.53In StockChromium (Cr) Sputtering Target
Chromium (Cr) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Chromium (Cr) Sputtering Target with the highest possible density and the lowest prices.
$91.01In StockEuropium (Eu) Sputtering Target
Europium (Eu) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Europium (Eu) Sputtering Target with the highest possible density and the lowest prices.
$525.53In StockGadolinium (Gd) Sputtering Target
Gadolinium (Gd) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Gadolinium (Gd) Sputtering Target with the highest possible density and the lowest prices.
$264.60In StockGermanium (Ge) Sputtering Target
Germanium (Ge) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Germanium (Ge) Sputtering Target with the highest possible density and the lowest prices.
$94.00In StockHafnium (Hf) Sputtering Target
Hafnium (Hf) Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Hafnium (Hf) Sputtering Target with the highest possible density and the lowest prices.
$158.03In StockHolmium (Ho) Sputtering Target
Holmium (Ho) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Holmium (Ho) Sputtering Target with the highest possible density and the lowest prices.
$438.56In StockIndium (In) Sputtering Target
Indium (In) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Indium (In) Sputtering Target with the highest possible density and the lowest prices.
$149.89In StockLanthanum (La) Sputtering Target
Lanthanum (La) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Lanthanum (La) Sputtering Target with the highest possible density and the lowest prices.
$385.88In StockLead (Pb) Sputtering Target
Lead (Pb) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Lead (Pb) Sputtering Target with the highest possible density and the lowest prices.
$88.20In Stock
Sputtering Targets Description
According to the types of materials, there are many classification methods for target materials, including metal and alloy targets, inorganic nonmetallic targets, and composite targets. Inorganic nonmetallic targets are divided into oxides, slides, nitride, and fluoride. At present, the most commonly used classification methods are divided according to the application of target materials, mainly including application target material in the semiconductor field, target material for the recording medium, target material for display film, optical target material, superconducting target material, etc. The composition and specific uses of the main target materials are listed in the following table.
Sputtering Targets Classify
Semiconductor-associated target material, Magnetic recording target material, Photo recording target material, Display target material, Other application target material.
Spluttering is one of the main techniques for preparing thin-film materials, which uses ions generated by ion sources to form high-velocity ion beams through accelerated aggregation in a vacuum, pounding the solid surface and undergoing kinetic energy exchange, making the yard of the solid surface leave the solid and deposit on the substrate surface. The bombarded solids are raw materials for the deposited thin film by a sputtering method, called sputtering targets.