Heeger Materials Inc is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Heeger Materials Inc is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Aluminum Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Aluminum Sputtering targets at competitive prices.
Antimony Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Antimony Sputtering Target at competitive prices.
Cadmium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Cadmium Sputtering Target at competitive prices.
Chromium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Chromium Sputtering Target at competitive prices.
Europium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Europium Sputtering Target at competitive prices.
Gadolinium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Gadolinium Sputtering Target at competitive prices.
Germanium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Germanium Sputtering Target at competitive prices.
Hafnium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Hafnium Sputtering Target at competitive prices.
Holmium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Holmium Sputtering Target at competitive prices.
Indium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Indium Sputtering Target at competitive prices.
Lanthanum Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lanthanum Sputtering Target at competitive prices.
Lead Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lead Sputtering Target at competitive prices.
Spluttering is one of the main techniques for preparing thin-film materials, which uses ions generated by ion sources to form high-velocity ion beams through accelerated aggregation in a vacuum, pounding the solid surface and undergoing kinetic energy exchange, making the yard of the solid surface leave the solid and deposit on the substrate surface. The bombarded solids are raw materials for the deposited thin film by a sputtering method, called sputtering targets.
The target material restricts the physical and mechanical properties of the sputtered film and affects the quality of the coating.
According to the types of materials, there are many classification methods for target materials, including metal and alloy targets, inorganic nonmetallic targets, and composite targets. Inorganic nonmetallic targets are divided into oxides, slides, nitride, and fluoride.
According to the application of the sputtering target, it can be divided into semiconductor fields, sputtering targets for recording media, sputtering targets for display films, optical targets, superconducting targets, etc.