Heeger Materials Inc is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Heeger Materials Inc is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Sputtering Targets There are 339 products.
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Aluminum (Al) Sputtering Target
Aluminum Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Aluminum Sputtering Target at competitive prices.
$189.06In Stock -
Antimony (Sb) Sputtering Target
Antimony Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Antimony Sputtering Target at competitive prices.
$433.66In Stock -
Cadmium (Cd) Sputtering Target
Cadmium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Cadmium Sputtering Target at competitive prices.
$231.53In Stock -
Chromium (Cr) Sputtering Target
Chromium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Chromium Sputtering Target at competitive prices.
$91.01In Stock -
Europium (Eu) Sputtering Target
Europium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Europium Sputtering Target at competitive prices.
$525.53In Stock -
Gadolinium (Gd) Sputtering Target
Gadolinium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Gadolinium Sputtering Target at competitive prices.
$264.60In Stock -
Germanium (Ge) Sputtering Target
Germanium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Germanium Sputtering Target at competitive prices.
$94.00In Stock -
Hafnium (Hf) Sputtering Target
Hafnium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Hafnium Sputtering Target at competitive prices.
$158.03In Stock -
Holmium (Ho) Sputtering Target
Holmium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Holmium Sputtering Target at competitive prices.
$438.56In Stock -
Indium (In) Sputtering Target
Indium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Indium Sputtering Target at competitive prices.
$149.89In Stock -
Lanthanum (La) Sputtering Target
Lanthanum Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lanthanum Sputtering Target at competitive prices.
$385.88In Stock -
Lead (Pb) Sputtering Target
Lead Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lead Sputtering Target at competitive prices.
$88.20In Stock
Sputtering Targets Description
Spluttering is one of the main techniques for preparing thin-film materials, which uses ions generated by ion sources to form high-velocity ion beams through accelerated aggregation in a vacuum, pounding the solid surface and undergoing kinetic energy exchange, making the yard of the solid surface leave the solid and deposit on the substrate surface. The bombarded solids are raw materials for the deposited thin film by a sputtering method, called sputtering targets.
Sputtering Targets Performance
The target material restricts the physical and mechanical properties of the sputtered film and affects the quality of the coating.
- Low impurity content, high purity.
- High density.
- Uniform composition and organization.
- Small grain size.
Sputtering Targets Preparation Process
- Casting. Melt the alloy raw material with certain ratio, then pour the alloy melt into the mold to form the ingot, and finally make the target by mechanical processing.
- Powder metallurgy. A certain proportion of alloy raw materials will be melted, cast into ingots and then crushed, the crushed powder formed by isostatic pressing, and then high-temperature sintering, and finally formed the target material.
Sputtering Targets Classify
According to the types of materials, there are many classification methods for target materials, including metal and alloy targets, inorganic nonmetallic targets, and composite targets. Inorganic nonmetallic targets are divided into oxides, slides, nitride, and fluoride.
According to the application of the sputtering target, it can be divided into semiconductor fields, sputtering targets for recording media, sputtering targets for display films, optical targets, superconducting targets, etc.