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Sputtering Targets

American Manufacturers, Factory, Suppliers | Heeger Materials

Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.

We will contact you with the price and availability of these items in 24 hours.

American Manufacturers, Factory, Suppliers | Heeger Materials

Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.

We will contact you with the price and availability of these items in 24 hours.

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Sputtering Targets There are 339 products.

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Showing 1 - 12 of 339 items

What Are Sputtering Targets?

The "target material" in sputtering targets comes from the shooting target material commonly seen in our lives. During the PVD coating process, the coating material is bombarded by an electron beam or an ion beam, just like the target material being shot, hence the name "target material". Spluttering is one of the main techniques for preparing thin-film materials, which uses ions generated by ion sources to form high-velocity ion beams through accelerated aggregation in a vacuum, pounding the solid surface and undergoing kinetic energy exchange, making the yard of the solid surface leave the solid and deposit on the substrate surface. Heeger Materials Inc., a professional supplier and manufacturer of high-quality Sputtering Targets, leverages extensive expertise in supply and export to offer competitive prices. 

Sputtering Targets Performance

The target material restricts the physical and mechanical properties of the sputtered film and affects the quality of the coating.

  1. Low impurity content, high purity.
  2. High density.
  3. Uniform composition and organization.
  4. Small grain size.

Sputtering Targets Preparation Process

  • Casting. Melt the alloy raw material with a certain ratio, then pour the alloy melt into the mold to form the ingot, and finally make the target by mechanical processing.
  • Powder metallurgy. A certain proportion of alloy raw materials will be melted, cast into ingots, and then crushed, the crushed powder will be formed by isostatic pressing, then high-temperature sintering, and finally the target material.

Sputtering Targets Classify

According to the types of materials, there are many classification methods for target materials, including metal and alloy targets, inorganic nonmetallic targets, and composite targets. Inorganic nonmetallic targets are divided into oxides, slides, nitride, and fluoride.

According to the application of the sputtering target, it can be divided into semiconductor fields, sputtering targets for recording media, sputtering targets for display films, optical targets, superconducting targets, etc.

What Are Sputtering Targets Used for?

Sputtering targets are used to produce thin films, usually metal films or other compound films. These films can be used in a variety of applications:

  1. Used to manufacture integrated circuits and other electronic components.
  2. Used to manufacture mirrors, lenses, and other optical components.
  3. General coating: used to improve product appearance, increase wear resistance, etc.
  4. Used to manufacture various layers of solar cells.
  5. Used to manufacture magnetic films, such as for magnetic storage devices.