Sputtering Targets
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American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Sputtering Targets There are 340 products.
Aluminum (Al) Sputtering Target
Aluminum Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) displays, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Aluminum Sputtering targets, offering competitive prices and customized solutions to meet specific requirements.
$189.06In StockAntimony (Sb) Sputtering Target
Antimony Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) displays, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Antimony Sputtering Target, offering competitive prices and customized solutions to meet specific requirements.
$433.66In StockCadmium (Cd) Sputtering Target
Cadmium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Cadmium Sputtering Target, offering competitive prices and customized solutions to meet specific requirements.
$231.53In StockChromium (Cr) Sputtering Target
Chromium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Chromium Sputtering Target at competitive prices.
$91.01In StockEuropium (Eu) Sputtering Target
Europium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Europium Sputtering Target at competitive prices.
$525.53In StockGadolinium (Gd) Sputtering Target
Gadolinium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Gadolinium Sputtering Target at competitive prices.
$264.60In StockGermanium (Ge) Sputtering Target
Germanium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Germanium Sputtering Targets, offering competitive prices and customized solutions to meet specific requirements.
$94.00In StockHafnium (Hf) Sputtering Target
Hafnium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Hafnium Sputtering Target, offering competitive prices and customized solutions to meet specific requirements.
$450.00In StockHolmium (Ho) Sputtering Target
Holmium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Holmium Sputtering Target at competitive prices.
$438.56In StockIndium (In) Sputtering Target
Indium Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) displays, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Indium Sputtering Target, offering competitive prices and customized solutions to meet specific requirements.
$149.89In StockLanthanum (La) Sputtering Target
Lanthanum Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lanthanum Sputtering Target at competitive prices.
$385.88In StockLead (Pb) Sputtering Target
Lead Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lead Sputtering Target at competitive prices.
$88.20In Stock
What Are Sputtering Targets?
The "target material" in sputtering targets comes from the shooting target material commonly seen in our lives. During the PVD coating process, the coating material is bombarded by an electron beam or an ion beam, just like the target material being shot, hence the name "target material". Spluttering is one of the main techniques for preparing thin-film materials, which uses ions generated by ion sources to form high-velocity ion beams through accelerated aggregation in a vacuum, pounding the solid surface and undergoing kinetic energy exchange, making the yard of the solid surface leave the solid and deposit on the substrate surface. Heeger Materials Inc., a professional supplier and manufacturer of high-quality Sputtering Targets, leverages extensive expertise in supply and export to offer competitive prices.
Sputtering Targets Performance
The target material restricts the physical and mechanical properties of the sputtered film and affects the quality of the coating.
- Low impurity content, high purity.
- High density.
- Uniform composition and organization.
- Small grain size.
Sputtering Targets Preparation Process
- Casting. Melt the alloy raw material with a certain ratio, then pour the alloy melt into the mold to form the ingot, and finally make the target by mechanical processing.
- Powder metallurgy. A certain proportion of alloy raw materials will be melted, cast into ingots, and then crushed, the crushed powder will be formed by isostatic pressing, then high-temperature sintering, and finally the target material.
Sputtering Targets Classify
According to the types of materials, there are many classification methods for target materials, including metal and alloy targets, inorganic nonmetallic targets, and composite targets. Inorganic nonmetallic targets are divided into oxides, slides, nitride, and fluoride.
According to the application of the sputtering target, it can be divided into semiconductor fields, sputtering targets for recording media, sputtering targets for display films, optical targets, superconducting targets, etc.
What Are Sputtering Targets Used for?
Sputtering targets are used to produce thin films, usually metal films or other compound films. These films can be used in a variety of applications:
- Used to manufacture integrated circuits and other electronic components.
- Used to manufacture mirrors, lenses, and other optical components.
- General coating: used to improve product appearance, increase wear resistance, etc.
- Used to manufacture various layers of solar cells.
- Used to manufacture magnetic films, such as for magnetic storage devices.