Germanium (Ge) Sputtering Target

Germanium is a hard, brittle metalloid with a grayish-white appearance. It has a density of 5.35 g/cc, melts at 937°C, and has a vapor pressure of 10⁻⁴ Torr at 1,167°C. As a semiconductor like silicon, it is commonly used in transistors and integrated circuits. Germanium is also evaporated for layers in optical storage media and coatings and serves as an alloying agent and catalyst.

HM provides high-quality Germanium Sputtering targets at competitive prices for research and industry purposes. We can provide Germanium Sputtering Target with different purity, size, and density per your requirements.

• High purity and density
• Low particle
• Uniform film thickness distribution
• High efficiency in the use

Germanium Sputtering Target Specifications

Germanium Sputtering Target Dimensions

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Germanium Sputtering Target Applications

Germanium Sputtering Target's applications span infrared optics, solar cells, fiber optic communications, specialty gases for semiconductors, and PET catalysts.

Germanium Sputtering Target Delivery and Packaging

The Lead time of the Germanium Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.