Barium (Ba) Sputtering Target can be...
Barium (Ba) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Barium (Ba) Sputtering Targets with the highest possible density and the lowest prices.
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Barium is a silvery-white metal that can be used in barium-nickel alloys for spark-plug electrodes an in vacuum tubes as drying and oxygen-removing agent. Its compounds are used to make drilling mud in oil and gas industries. The antomic mass of Barium is 137.327 amu and the melting point is 725.0 °C (998.15 K, 1337.0 °F). The density is 3.51 and the crystal is Cubic. Besides sputtering target, we also can offer Barium powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Packing: The Barium (Ba) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you feedback in 24 hours.