Heeger Materials Inc is a leading supplier of high-purity materials including sputtering targets and evaporation materials. We offer pure elements, compounds, alloys, ceramics, intermetallics, and mixtures in a sort of shapes, sizes, and purities for both R&D and Production applications.
We will contact you with the price and availability in 24 hours.
Heeger Materials Inc is a leading supplier of high-purity materials including sputtering targets and evaporation materials. We offer pure elements, compounds, alloys, ceramics, intermetallics, and mixtures in a sort of shapes, sizes, and purities for both R&D and Production applications.
We will contact you with the price and availability in 24 hours.
Deposition Materials There are 295 products.
Subcategories
Sputtering Targets
American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Evaporation Materials
Heeger Materials Inc is a supplier of high-purity evaporation materials at a competitive price. Various evaporation materials are in stock and customized services are also available.
We will contact you with the price and availability of these items in 24 hours.
Target Bonding Service
Heeger Materials Inc provides Indium-based Metallic Bonding, Elastomer Bonding, and OFHC Copper Backing Plates at a competitive price. The thermal and mechanical integrity of the bond between a sputtering target and its backing plate is essential to ensure optimum sputtering performance.
Aluminum (Al) Sputtering Target
Aluminum Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) displays, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Aluminum Sputtering targets, offering competitive prices and customized solutions to meet specific requirements.
$189.06In Stock
Indium Sulfide (In2S3) Target
Heeger Materials offers a selection of over 100 high purity products, including metals, metal oxides and metal salts, with 99.999% purity or higher. We can provide Indium Sulfide (In2S3) Sputtering Target with the purity of 99.99%, 99.999%,99.9999% and 99.99999% in size of ingot, lump and powder.
Gallium Selenide (Ga2Se3) Target
Heeger Materials offers a selection of over 100 high purity products, including metals, metal oxides, and metal salts, with 99.999% purity or higher. We can provide Gallium Selenide (Ga2Se3) Sputtering Target with the purity of 99.99%, 99.999%,99.9999%, and 99.99999% in size of ingot, lump, and powder.
Titanium Pentoxide (Ti3O5) Evaporation...
HM stocks a wide variety of Trititanium Pentoxide (Ti3O5) Sinter Tablets and Trititanium Pentoxide (Ti3O5) Crystal Granules at high purity. We also began the production of other Ti Oxides, such as TiO2, Ti2O3, TiO2, TiO, etc. The purity is from 99.9% to 99.9999%.
$249.00In Stock
Indium Selenide (In2Se3) Target
We can provide Indium Selenide (In2Se3) Sputtering Target with the purity of 99.99%, 99.999%,99.9999% and 99.99999% in size of ingot, lump and powder. Heeger Materials offers a selection of over 100 high purity products, including metals, metal oxides and metal salts, with 99.999% purity or higher.
Copper Indium Selenide (CIS, CuInSe2) Target
Heeger Materials offers a selection of over 100 high purity products, including metals, metal oxides and metal salts, with 99.999% purity or higher. We can provide Copper Indium Selenide (CIS, CuInSe2) Target with the purity of 99.99%, 99.999%,99.9999% and 99.99999% in size of ingot, lump and powder.
Lithium Fluoride (LiF) Evaporation Material
High Purity Evaporation Materials in form of pieces, granules, or pellets. Packed in glass vials in quantities varying from 5-25 grams. Used for thin-film research, thermal evaporation, and electron microscopy coatings. HM is a leading vendor of high purity Lithium Fluoride (LiF) Evaporation Material. The materials are available in various purities...
$299.00In Stock
Bi2Te3 Target
Heeger Materials offers a selection of over 100 high purity products, including metals, metal oxides and metal salts, with 99.999% purity or higher. We can provide Bi2Te3 target with the purity of 99.99%, 99.999%,99.9999% and 99.99999% in size of ingot, lump and powder.
Germanium Antimony Tellurium | Ge2Sb2Te5 (...
Germanium Antimony Tellurium (Ge2Sb2Te5) is a composite semiconductor material composed of tellurium, germanium, and antimony elements. Heeger Materials can provide the best Germanium Antimony Tellurium (Ge2Sb2Te5/Ge22Sb22Ge25) with a purity of 99.99% and 99.999% in the size of lump and powder at a competitive price. The size can be tailored according to...
Graphite (C) Sputtering Target
Graphite Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Graphite Sputtering Target at competitive prices.
$197.00In StockGadolinium Oxide (Gd2O3) Sputtering Target
Gadolinium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Gadolinium Oxide Sputtering Target at competitive prices.
$358.00In StockGadolinium Oxide (Gd2O3) Evaporation Material
High Purity Evaporation Materials in form of pieces, granules, or pellets. Packed in glass vials in quantities varying from 5-25 grams. Used for thin-film research, thermal evaporation, and electron microscopy coatings. HM is a leading vendor of high purity Gadolinium Oxide (Gd2O3) Evaporation Material. Our evaporation materials are available in various...
$239.00In Stock
Deposition Materials Description
Deposition materials include sputtering targets, evaporation materials, and Evaporation Sources. Sputtering is one of the main techniques for preparing thin-film materials, which uses ions generated by ion sources to form high-velocity ion beams through accelerated aggregation in a vacuum, pounding the solid surface and undergoing kinetic energy exchange, making the yard of the solid surface leave the solid and deposit on the substrate surface. The bombarded solids are raw materials for the deposited thin film by a sputtering method, called sputtering targets. Vacuum evaporation is putting the workpiece and coating material to be plated in the vacuum room, vacuuming, and then heating the evaporation material to be evaporated and deposited on the workpiece surface. The coating material used is called the evaporative material.
From the purpose of the application, both target and evaporation source materials are coating materials, here collectively known as target materials. As a special electronic material with high added value, it is mainly used in microelectronics, display, storage materials, and optical coating industries to manufacture various coating materials for cutting-edge technology.
Vacuum Coating Material Process Flow
Raw material powder - Batching - Mixing - Material pretreatment - Molding - Presintering - Vacuum sintering - Sorting - Vacuum packaging