Aluminum (Al) Sputtering Target can...
Aluminum (Al) Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. HM specializes in producing high purity Aluminum (Al) Sputtering Target with the highest possible density and the lowest prices.
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Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
Aluminum (Al), also called Aluminum, is a chemical element whose atomic number is 13. Aluminum is an abundant, light, and strong metal which can be used in aviation, construction, and automotive industries. The atomic mass of Aluminum is 26.981539 amu and the melting point is 660.37 °C (933.52 K, 1220.666 °F). The density is 2.702 and the crystal is Cubic. Besides sputtering target, we also can offer Aluminum powder, bar, sheet, foil, disc, ribbon, and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources, and other deposition materials are listed by material throughout the website.
Other Purity for Aluminum (Al) Sputtering Target: 99.9% - 99.9995%
Other Shape for Aluminum (Al) Sputtering Target: Discs, Plates, Column Targets, Step Targets, Custom-made
Packing: The Aluminum (Al) Sputtering Target is vacuum-sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you feedback in 24 hours.