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Hafnium Sputtering Target can be used...
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Hafnium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Hafnium Sputtering Target, offering competitive prices and customized solutions to meet specific requirements.
Warning: Last items in stock!
Availability date: 01/24/2016
Shape | Disc/Rectangular/Tube |
Bonding | Unbonding/Bonding |
Symbol | Hf |
Purity | 99.9% |
HM provides high-quality Hafnium Sputtering Target at competitive prices for research and industry purposes. We can provide Hafnium Sputtering Target with different purity, size, and density per your requirements.
Material Type | Hafnium | Coefficient of Thermal Expansion | 5.9 x 10-6/K |
Symbol | Hf | Theoretical Density (g/cc) | 13.31 |
Atomic Weight | 178.49 | Z Ratio | 0.36 |
Atomic Number | 72 | Sputter | DC |
Color/Appearance | Gray Steel, Metallic | Max Power Density (Watts/Square Inch) | 50* |
Thermal Conductivity | 23 W/m.K | Type of Bond | Indium, Elastomer |
Melting Point (°C) | 2,227 |
|
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” |
Thickness | 0.125”, 0.25” |
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
By introducing an oxygen partial pressure, hafnium sputtering targets can be used in either DC sputtering or reactive sputtering to produce hafnium oxide thin films. These films are suitable for various applications, including optical coatings for photonics, thin-film resistors, corrosion resistance, nuclear products, gate dielectrics in integrated circuits, and sensors.
The Lead time of the Hafnium Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.
Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.
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