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Sale! Hafnium (Hf) Sputtering Target-Heeger Materials Inc View larger

Hafnium (Hf) Sputtering Target

New product

Hafnium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Hafnium Sputtering Target, offering competitive prices and customized solutions to meet specific requirements.

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Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

$450.00

  • 99.9%




Data sheet

ShapeDisc/Rectangular/Tube
BondingUnbonding/Bonding
SymbolHf
Purity99.9%

More info

HM provides high-quality Hafnium Sputtering Target at competitive prices for research and industry purposes. We can provide Hafnium Sputtering Target with different purity, size, and density per your requirements.

  • High purity and density
  • Low particle
  • Uniform film thickness distribution
  • High efficiency in the use

Hafnium Sputtering Target Specifications

Material Type

Hafnium

Coefficient of Thermal Expansion

5.9 x 10-6/K

Symbol

Hf

Theoretical Density (g/cc)

13.31

Atomic Weight

178.49

Z Ratio

0.36

Atomic Number

72

Sputter

DC

Color/Appearance

Gray Steel, Metallic

Max Power Density (Watts/Square Inch)

50*

Thermal Conductivity

23 W/m.K

Type of Bond

Indium, Elastomer

Melting Point (°C)

2,227

 

Hafnium Sputtering Target Dimensions

Circular Sputtering Targets

Diameter

1.0”

2.0”

3.0”

4.0”

5.0”

6.0”

up to 21”

Rectangular Sputtering Targets

Width x Length

5” x 12”

5” x 15”

5” x 20”

5” x 22”

6” x 20”

Thickness

0.125”, 0.25”

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Hafnium Sputtering Target Applications

By introducing an oxygen partial pressure, hafnium sputtering targets can be used in either DC sputtering or reactive sputtering to produce hafnium oxide thin films. These films are suitable for various applications, including optical coatings for photonics, thin-film resistors, corrosion resistance, nuclear products, gate dielectrics in integrated circuits, and sensors.

Hafnium Sputtering Target Delivery and Packaging

The Lead time of the Hafnium Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.

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