Hafnium (Hf) Sputtering Target

HM provides high-quality Hafnium Sputtering Target at competitive prices for research and industry purposes. We can provide Hafnium Sputtering Target with different purity, size, and density per your requirements.

• High purity and density
• Low particle
• Uniform film thickness distribution
• High efficiency in the use

Hafnium Sputtering Target Specifications

Hafnium Sputtering Target Dimensions

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Hafnium Sputtering Target Applications

By introducing an oxygen partial pressure, hafnium sputtering targets can be used in either DC sputtering or reactive sputtering to produce hafnium oxide thin films. These films are suitable for various applications, including optical coatings for photonics, thin-film resistors, corrosion resistance, nuclear products, gate dielectrics in integrated circuits, and sensors.

Hafnium Sputtering Target Delivery and Packaging

The Lead time of the Hafnium Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.