Sale! Chromium (Cr) Sputtering Target-Heeger Materials Inc View larger

Chromium (Cr) Sputtering Target

New product

Chromium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Chromium Sputtering Target at competitive prices.

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$91.01

  • 99.5%




Data sheet

ShapeDisc/Rectangular/Tube
BondingUnbonding/Bonding
SymbolCr
Purity99.5%

More info

Chromium is a popular metal known for its silvery luster, hardness, and brittleness, with a high mirror polish and excellent corrosion resistance. It has a melting point of 1,857°C, a density of 7.2 g/cc, and a vapor pressure of 10⁻⁴ Torr at 1,157°C. Named from the Greek word "chroma," meaning color, due to its colorful compounds, chromium is widely used in the automobile industry for shiny coatings on wheels and bumpers. It is also used in vacuum applications for automotive glass coatings, photovoltaic cell fabrication, battery production, and decorative and corrosion-resistant coatings.

HM provides high-quality Chromium Sputtering Target for research and industry purposes at competitive prices. We can provide Chromium Sputtering Targets with different purity, size, and density per your requirements.

  • High purity and density
  • Low particle
  • Uniform film thickness distribution
  • High efficiency in the use

Chromium Sputtering Target Specifications

Material Type

Chromium

Coefficient of Thermal Expansion

4.9 x 10-6/K

Symbol

Cr

Theoretical Density (g/cc)

7.2

Atomic Weight

51.9961

Z Ratio

0.305

Atomic Number

24

Sputter

DC

Color/Appearance

Silvery, Metallic

Max Power Density (Watts/Square Inch)

80*

Thermal Conductivity

94 W/m.K

Type of Bond

Indium, Elastomer

Melting Point (°C)

1,857

Comments

Films are very adherent. High rates are possible.

Chromium Sputtering Target Dimensions

Circular Sputtering Targets

Diameter

1.0”

2.0”

3.0”

4.0”

5.0”

6.0”

up to 21”

Rectangular Sputtering Targets

Width x Length

5” x 12”

5” x 15”

5” x 20”

5” x 22”

6” x 20”

Thickness

0.125”, 0.25”

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Chromium Sputtering Target Applications

Chromium Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Chromium Sputtering Target Delivery and Packaging

The Lead time of the Chromium Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.

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