Chromium (Cr) Sputtering Target can...
Chromium (Cr) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Chromium (Cr) Sputtering Target with the highest possible density and the lowest prices.
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Chromium is a lustrous, brittle, hard and corrosion resistance metal. The main usesages of chromium are in alloys such as stainless steel, in chrome plating and in metal ceramics. Chromium plating was once widely used to give steel a polished silvery mirror coating. Chromium oxide (CrO2) is used to manufacture magnetic tape. The antomic mass of Chromium is 51.9961 amu and the melting point is 1857.0 °C (2130.15 K, 3374.6 °F). The density is 7.19 and the crystal is Cubic. Besides sputtering target, we also can offer Chromium powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Other Purity for Chromium (Cr) Sputtering Target:99.5% - 99.99%
Other Shape for Chromium (Cr) Sputtering Target: Discs, Plates, Column Targets, Step Targets, Custom-made
Packing: The Chromium (Cr) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you feedback in 24 hours.