Niobium sputtering targets are mainly used in optical coating, surface engineering material coating, and heat-resistant, corrosion-resistant, and highly conductive coating industries. In the field of optical coating, it is mainly used in ophthalmic optical products, lenses, precision optics, large-area coating, 3D coating, and so on.
Niobium sputtering targets, often referred to as bare targets, are first welded to a copper backing target and then sputtered to deposit niobium atoms in oxide form on the substrate material to realize sputter coating. As niobium sputtering target technology and applications continue to deepen and expand, the requirements for the organization of niobium target uniformity increase, mainly in the grain size refinement, no obvious weaving orientation, and improved chemical purity in three aspects.
The uniform distribution of the organizational properties of the whole target is essential to ensure the sputtering performance of niobium targets. The surface of niobium targets encountered in industrial production usually has a regular pattern, which greatly affects the sputtering performance of the target, how can we improve the target utilization?
It has been found that the impurity content (target purity) is an important reason affecting the purity. The uneven chemical composition of raw materials and the enrichment of impurities from regular lines on the surface of niobium targets after rolling; eliminating the uneven distribution of raw materials and the enrichment of impurities can avoid the formation of regular lines on the surface of niobium targets. The influence of grain size and organization composition on the target is almost negligible.
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