Deposition Materials
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Heeger Materials Inc is a leading supplier of high-purity materials including sputtering targets and evaporation materials. We offer pure elements, compounds, alloys, ceramics, intermetallics, and mixtures in a sort of shapes, sizes, and purities for both R&D and Production applications.
We will contact you with the price and availability in 24 hours.
Heeger Materials Inc is a leading supplier of high-purity materials including sputtering targets and evaporation materials. We offer pure elements, compounds, alloys, ceramics, intermetallics, and mixtures in a sort of shapes, sizes, and purities for both R&D and Production applications.
We will contact you with the price and availability in 24 hours.
Deposition Materials There are 306 products.
Subcategories
Sputtering Targets
American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Evaporation Materials
Heeger Materials Inc is a supplier of high-purity evaporation materials at a competitive price. Various evaporation materials are in stock and customized services are also available.
We will contact you with the price and availability of these items in 24 hours.
Target Bonding Service
Heeger Materials Inc provides Indium-based Metallic Bonding, Elastomer Bonding, and OFHC Copper Backing Plates at a competitive price. The thermal and mechanical integrity of the bond between a sputtering target and its backing plate is essential to ensure optimum sputtering performance.
Lead Titanate (PbTiO3) Sputtering Target
Lead Titanate Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lead Titanate Sputtering Target at competitive prices.
Lanthanum Calcium Manganate...
Lanthanum Calcium Manganate Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lanthanum Calcium Manganate Sputtering Target at competitive prices.
Lanthanum Manganate (LaMnO3) Sputtering...
Lanthanum Manganate Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lanthanum Manganate Sputtering Target at competitive prices.
Neodymium Oxide (Nd2O3) Sputtering Target
Neodymium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Neodymium Oxide Sputtering Target at competitive prices.
Thulium Oxide (Tm2O3) Sputtering Target
Thulium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Thulium Oxide Sputtering Target at competitive prices.
Samarium Oxide (Sm2O3) Sputtering Target
Samarium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Samarium Oxide Sputtering Target at competitive prices.
$294.00In Stock
Praseodymium Oxide (Pr6O11) Sputtering Target
Praseodymium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Praseodymium Oxide Sputtering Target at competitive prices.
Silicon Monoxide (SiO) Sputtering Target
Silicon Monoxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Silicon Monoxide Sputtering Target at competitive prices.
Terbium Oxide (Tb4O7) Sputtering Target
Terbium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Terbium Oxide Sputtering Target at competitive prices.
Titanium Trioxide (Ti2O3) Sputtering Target
Titanium Trioxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Titanium Trioxide Sputtering Target at competitive prices.
Ytterbium Oxide (Yb2O3) Sputtering Target
Ytterbium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Ytterbium Oxide Sputtering Target at competitive prices.
$358.00In Stock
Hafnium Nitride (HfN) Sputtering Target
Hafnium Nitride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Hafnium Nitride Sputtering Target at competitive prices.
