Heeger Materials Inc is a leading supplier of high-purity materials including sputtering targets and evaporation materials. We offer pure elements, compounds, alloys, ceramics, intermetallics, and mixtures in a sort of shapes, sizes, and purities for both R&D and Production applications.
We will contact you with the price and availability in 24 hours.
Heeger Materials Inc is a leading supplier of high-purity materials including sputtering targets and evaporation materials. We offer pure elements, compounds, alloys, ceramics, intermetallics, and mixtures in a sort of shapes, sizes, and purities for both R&D and Production applications.
We will contact you with the price and availability in 24 hours.
Deposition Materials There are 290 products.
Subcategories
Sputtering Targets
American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Evaporation Materials
Heeger Materials Inc is a supplier of high-purity evaporation materials at a competitive price. Various evaporation materials are in stock and customized services are also available.
We will contact you with the price and availability of these items in 24 hours.
Target Bonding Service
Heeger Materials Inc provides Indium-based Metallic Bonding, Elastomer Bonding, and OFHC Copper Backing Plates at a competitive price. The thermal and mechanical integrity of the bond between a sputtering target and its backing plate is essential to ensure optimum sputtering performance.
Holmium Oxide (Ho2O3) Sputtering Target
Holmium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Holmium Oxide Sputtering Target at competitive prices.
Molybdenum Oxide (MoO3) Sputtering Target
Molybdenum Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Molybdenum Oxide Sputtering Target at competitive prices.
$588.00In Stock
Chromium Carbide (Cr3C2) Sputtering Target
Chromium Carbide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Chromium Carbide Sputtering Target at competitive prices.
Scandium Oxide (Sc2O3) Sputtering Target
Scandium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Scandium Oxide Sputtering Target at competitive prices.
Rhenium (Re) Sputtering Target
Rhenium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Rhenium Sputtering Target at competitive prices.
Terbium (Tb) Sputtering Target
Terbium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Terbium Sputtering Target at competitive prices.
$520.00In Stock
Rhodium (Rh) Sputtering Target
Rhodium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Rhodium Sputtering Target at competitive prices.
Pure Silicon (Si) Sputtering Target
Pure Silicon Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Pure Silicon Sputtering Target at competitive prices.
Cobalt Oxide (CoO) Sputtering Target
Cobalt Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Cobalt Oxide Sputtering Target at competitive prices.
$294.00In StockBlack Iron Oxide (Fe3O4) Sputtering Target
Black Iron Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Black Iron Oxide Sputtering Target at competitive prices.
$249.00In Stock
Erbium Oxide (Er2O3) Sputtering Target
Erbium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Erbium Oxide Sputtering Target at competitive prices.
Europium Oxide (Eu2O3) Sputtering Target
Europium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Europium Oxide Sputtering Target at competitive prices.
$391.00In Stock
