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Rhodium (Rh) Sputtering Target

HTST306

New product

Rhodium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Rhodium Sputtering Target at competitive prices.

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Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Data sheet

ShapeDisc/Rectangular/Tube
BondingUnbonding/Bonding
SymbolRh
Purity99.9% - 99.99%

More info

HM provides high-quality Rhodium Sputtering Target for research and industry purposes at competitive prices. We can provide Rhodium Sputtering Target with different purity, size, and density according to your requirements.

Rhodium (Rh) Sputtering Target

  • High purity and density
  • Low particle
  • Uniform film thickness distribution
  • High efficiency in the use

Rhodium Sputtering Target Dimensions

Circular Sputtering Targets

Diameter

1.0”

2.0”

3.0”

4.0”

5.0”

6.0”

up to 21”

Rectangular Sputtering Targets

Width x Length

5” x 12”

5” x 15”

5” x 20”

5” x 22”

6” x 20”

Thickness

0.125”, 0.25”

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Rhodium Sputtering Target Speicfications

Symbol

Rh

Atomic Weight

102.9

Atomic Number

45

Color/Appearance

Silvery White Metallic

Thermal Conductivity

150 W/m·K

Melting Point (℃)

1966

Coefficient of Thermal Expansion

8.2×10-6/K

Theoretical Density (g/cc)

12.41

Z Ratio

0.21

Sputter

DC

Max Power Density (Watts/Square Inch)

20*

Type of Bond

Indium, Elastomer

Rhodium Sputtering Target Applications

Rhodium Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Rhodium Sputtering Target Delivery and Packaging

The Lead time of the Rhodium Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.

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