Chromium Nitride (Cr2N) Sputtering...
Chromium Nitride (Cr2N) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Reaction sputtering chromium nitride film can get Cr + Cr2N or single-phase CrN two kinds of organization.
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|Purity||99.5% - 99.9%|
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Packing: The Chromium Nitride (Cr2N) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you feedback in 24 hours.