Sputtering Targets
- Products
- Deposition Materials
- Refractory Metals
- Rare Earth Materials
- Powder
- Technical Ceramics
- Lanthanum Hexaboride (LaB6) Materials
- Pyrolytic Boron Nitride (PBN) Products
- Boron Nitride (BN) Products
- Alumina Ceramics (Al2O3)
- Aluminum Nitride (AlN) Products
- Silicon NItride (Si3N4) Ceramics
- Silicon Carbide (SiC) Ceramics
- Graphite Products
- Zirconia Ceramic
- MAX Phase Ceramic Materials
- Boron Carbide Ceramics (B4C)
- Magnesium Oxide Ceramics (MgO)
- Quartz Ceramics
- Macor Machinable Glass Ceramic
- Beryllium Oxide (BeO) Ceramics
- Piezoelectric Ceramics
- High Purity Materials
- Precious Metals
- Chemicals
- Crystals ＆ Substrates
- Applications
- Other
American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Sputtering Targets There are 340 products.
Cadmium Fuoride (CdF2) Sputtering Target
Cadmium Fuoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Cadmium Fuoride Sputtering Target at competitive prices.
Calcium Fluoride (CaF2) Sputtering Target
Calcium Fluoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Calcium Fluoride Sputtering Target at competitive prices.
$326.00In Stock
Cerium Fluoride (CeF3) Sputtering Target
Cerium Fluoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Cerium Fluoride Sputtering Target at competitive prices.
Cesium Fluoride (CsF) Sputtering Target
Cesium Fluoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Cesium Fluoride Sputtering Target at competitive prices.
Chromium Fluoride (CrF3) Sputtering Target
Chromium Fluoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Chromium Fluoride Sputtering Target at competitive prices.
Dysprosium Fluoride (DyF3) Sputtering Target
Dysprosium Fluoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Dysprosium Fluoride Sputtering Target at competitive prices.
Erbium Fluoride (ErF3) Sputtering Target
Erbium Fluoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Erbium Fluoride Sputtering Target at competitive prices.
Gadolinium Fluoride (GdF3) Sputtering Target
Gadolinium Fluoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Gadolinium Fluoride Sputtering Target at competitive prices.
Hafnium Fluoride (HfF4) Sputtering Target
Hafnium Fluoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Hafnium Fluoride Sputtering Target at competitive prices.
Lithium Fluoride (LiF) Sputtering Target
Lithium Fluoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lithium Fluoride Sputtering Target at competitive prices.
$488.00In Stock
Lanthanum fluoride (LaF3) Sputtering Target
Lanthanum fluoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lanthanum fluoride Sputtering Target at competitive prices.
Manganese Fluoride (MnF2) Sputtering Target
Manganese Fluoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Manganese Fluoride Sputtering Target at competitive prices.
