American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Sputtering Targets There are 339 products.
Zinc Nitride (Zn3N2) Sputtering Target
Zinc Nitride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Zinc Nitride Sputtering Target at competitive prices.
Zirconium Nitride (ZrN) Sputtering Target
Zirconium Nitride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Zirconium Nitride Sputtering Target at competitive prices.
Boron Carbide (B4C) Sputtering Target
Boron Carbide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Boron Carbide Sputtering Target at competitive prices.
Chromium Carbide (Cr3C2) Sputtering Target
Chromium Carbide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Chromium Carbide Sputtering Target at competitive prices.
Hafnium Carbide (HfC) Sputtering Target
Hafnium Carbide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Hafnium Carbide Sputtering Target at competitive prices.
Iron Carbide (Fe3C) Sputtering Target
Iron Carbide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Iron Carbide Sputtering Target at competitive prices.
Molybdenum Carbide (Mo2C) Sputtering Target
Molybdenum Carbide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Molybdenum Carbide Sputtering Target at competitive prices.
Niobium Carbide (NbC) Sputtering Target
Niobium Carbide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Niobium Carbide Sputtering Target at competitive prices.
Tantalum Carbide (TaC) Sputtering Target
Tantalum Carbide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Tantalum Carbide Sputtering Target at competitive prices.
Titanium Carbide (TiC) Sputtering Target
Titanium Carbide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Titanium Carbide Sputtering Target at competitive prices.
$326.00In StockAluminum Fluoride (AlF3) Sputtering Target
Aluminum Fluoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Aluminum Fluoride Sputtering Target at competitive prices.
$358.00In Stock
Barium Fluoride (BaF2) Sputtering Target
Barium Fluoride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Barium Fluoride Sputtering Target at competitive prices.
