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Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Magnesium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Magnesium Oxide Sputtering Target at competitive prices.
Nickel Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Nickel Oxide Sputtering Target at competitive prices.
Niobium Oxide Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Niobium Oxide Sputtering Target at competitive prices.
Silicon Dioxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Silicon Dioxide Sputtering Target at competitive prices.
Strontium Titanate Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Strontium Titanate Sputtering Target at competitive prices.
High-purity Tantalum Oxide (Ta₂O₅) Sputtering Targets for optical coatings, semiconductor thin films, dielectric layers, and PVD applications. Available in circular, rectangular, and custom shapes with custom purity, dimensions, density, and bonding options. Send us your specifications or drawing for a quote.
Titanium Dioxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Titanium Dioxide Sputtering Target at competitive prices.
Titanium Monoxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Titanium Monoxide Sputtering Target at competitive prices.
Tungsten Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Tungsten Oxide Sputtering Target at competitive prices.
Vanadium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Vanadium Oxide Sputtering Target at competitive prices.
Yttrium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Yttrium Oxide Sputtering Target at competitive prices.
Zinc Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Zinc Oxide Sputtering Target at competitive prices.