Gallium Oxide (Ga2O3) Evaporation Material is made of high purity Ga2O3 powder, which can be used for electron beam and thermal evaporation. The available shapes are pellets and shots. Customized purity and dimensions are available. HM is a leading manufacturer and supplier of various evaporation materials.
Yttrium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Yttrium Oxide Sputtering Target at competitive prices.
High Purity Evaporation Materials in form of pieces, granules or pellets. Packed in glass vials in quantities varying from 5-25 grams. Used for thin film research, thermal evaporation and electron microscopy coatings. HM is a leading vendor of high purity Cobalt (Co) Evaporation Material. Our evaporation materials are available in various purities ranging...
High Purity Evaporation Materials in form of pieces, granules or pellets. Packed in glass vials in quantities varying from 5-25 grams. Used for thin film research, thermal evaporation and electron microscopy coatings. HM is a leading vendor of high purity Aluminum Nitride (AlN) Evaporation Material. Our evaporation materials are available in various...
Holmium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Holmium Sputtering Target at competitive prices.
Dysprosium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Dysprosium Sputtering Target at competitive prices.
Tantalum Nitride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Tantalum Nitride Sputtering Target at competitive prices.
Graphite Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Graphite Sputtering Target at competitive prices.
Bismuth Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Bismuth Oxide Sputtering Target at competitive prices.
High Purity Evaporation Materials in form of pieces, granules or pellets. Packed in glass vials in quantities varying from 5-25 grams. Used for thin-film research, thermal evaporation and electron microscopy coatings. HM is a leading vendor of high purity Iron Oxide (Fe2O3) Evaporation Material. Our evaporation materials are available in various purities...
High Purity Evaporation Materials in form of pieces, granules or pellets. Packed in glass vials in quantities varying from 5-25 grams. Used for thin film research, thermal evaporation and electron microscopy coatings.HM is a leading vendor of high purity Vanadium Pentoxide (V2O5) Evaporation Material. Our evaporation materials are available in various...
High Purity Evaporation Materials in form of pieces, granules, or pellets. Packed in glass vials in quantities varying from 5-25 grams. Used for thin-film research, thermal evaporation, and electron microscopy coatings. HM is a leading vendor of high purity Chromium (Cr) Evaporation Material. Our evaporation materials are available in various purities...