High-Purity Niobium (Nb) Sputtering Target

Niobium, a transition metal, is often found with tantalum and shares many of its properties. It has a melting point of 2,468°C, a density of 8.57 g/cc, and a vapor pressure of 10^-4 Torr at 2,287°C. While usually metallic gray, it can appear bluish when exposed to air. Niobium is used in superconducting alloys, and jewelry, and for making semiconductor, optical, and wear-resistant coatings through vacuum evaporation.

HM provides high-quality Niobium Sputtering Target for research and industry purposes at competitive prices. We can provide Niobium Sputtering Target with different purity, size, and density per your requirements.

• High purity and density
• Low particle
• Uniform film thickness distribution
• High efficiency in the use

Niobium Sputtering Target Specifications

Niobium Sputtering Target Dimensions

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Niobium Sputtering Target Applications

Niobium Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Niobium Sputtering Target Delivery and Packaging

The Lead time of the Niobium Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.