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Spherical chromium powder has the...
ME24-SP
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Spherical chromium powder has the characteristics of high sphericity, good fluidity, high purity, large loose density, full density inside particles, no hollow powder, and so on. HM provides spherical Chromium (Cr) Powder at a competitive price, which can be used in Scientific research or industrial production.
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Shape | Spherical / Ball Powder |
Particle Size | 15-45μm, 15-53μm, 45-75μm, 45-105μm, 75-150μm, customized |
Spherical chromium powder has the characteristics of high sphericity, good fluidity, high purity, large loose density, full density inside particles, no hollow powder, and so on. Spherical chromium powder can be widely used in cemented carbide, diamond tools, welding materials, buttons, and other fields and it is suitable for laser/electron beam material manufacturing, thermal isostatic pressing, laser cladding, vacuum coating, thermal spraying, cold spraying, and so on.
5-25μm, 15-45μm, 15-53μm, 45-75μm, 45-105μm, 75-150μm. (Various granularities can be customized according to customer requirements)
High purity (≥99.9%), low oxygen (≤300ppm), high sphericity (≥98%), smooth surface, no satellite spheres, uniform particle size distribution, and excellent flow properties (≤15.0s/50g), and high bulk density (≥4.5g/cm3) and tap density (≥5.5g/cm3).
laser/electron beam additive manufacturing (SLM/EBM, 3D printing), laser direct deposition (DLD), powder hot isostatic pressing (HIP), metal injection molding (MIM), powder metallurgy (PM), laser cladding ( LC), and other processes.
RF plasma spheroidized chromium powder has the characteristics of high sphericity, good fluidity, high purity, large loose packing density, the full internal density of the particles, and no hollow powder. It is widely used in cemented carbide, diamond tools, and welding materials. , Palladium, vacuum coating, thermal spraying, ceramics, etc.
vacuum packaging, 1kg/bag, 2kg/bag; iron drum lined with plastic bag 25 kg/drum; special packaging is available according to user requirements.
Chemical Composition - by ICP-AES | ||||||||
Element | Cr | Fe | Si | Al | Mo | Ti | W | Ni |
Value (%) | ≥99.9 | <0.02 | <0.01 | <0.006 | <0.005 | <0.001 | <0.001 | <0.001 |
Gas Impurities | ||||||||
Element | C | S | O | N | ||||
Value (%) | </= 0.005 | </= 0.001 | </= 0.030 | </= 0.004 |
Density (g/cm3) | Hall Flow Rate (s/50g) | |
Apparent Density | Tap Density | Value |
>4.2 | >5.5 | </= 15.0 |
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