Tantalum Silicide Sputtering Target...
Tantalum Silicide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Tantalum Silicide Sputtering Target at competitive prices.
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HM provides high-quality Tantalum Silicide Sputtering Target for research and industry purposes at competitive prices. We can provide Tantalum Silicide Sputtering Target with different purity, size, and density according to your requirements.
Circular Sputtering Targets
up to 21”
Rectangular Sputtering Targets
Width x Length
5” x 12”
5” x 15”
5” x 20”
5” x 22”
6” x 20”
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Tantalum Silicide Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
The Lead time of the Tantalum Silicide Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.
Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.