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Germanium Selenide (GeSe2) Sputtering Target

Reference: HTST553

Condition: New product

Germanium Selenide (GeSe2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Germanium Selenide (GeSe2) Sputtering Targets with the highest possible density and the lowest prices.

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Germanium Selenide (GeSe2) Sputtering Target
Germanium Selenide (GeSe2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Germanium Selenide (GeSe2) Sputtering Targets with the highest possible density and the lowest prices.
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Data sheet

Shape	Round/Rectangular/Delta/Customized
Purity	99.9% - 99.99%

More info

Germanium Selenide (GeSe2) is orange crystal, orthogonal structure. Density :4.56g/cm³, Melting point: 707℃. Germanium Selenide (GeSe2) is easily oxidized by heating in the air, and does not react with acid, but easily oxidized by nitric acid to form germanium dioxide.

We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.

Packing: The Germanium Selenide (GeSe2) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.

Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.

sputtering-target packing1.jpg supptering-target packing2.jpg

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