American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Sputtering Targets There are 339 products.
Indium Gallium Zinc Oxide (InGaZnOx)...
Indium Gallium Zinc Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Indium Gallium Zinc Oxide Sputtering Target at competitive prices.
Indium Iron Oxide (InFe2O4) Sputtering Target
Indium Iron Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Indium Iron Oxide Sputtering Target at competitive prices.
Indium Tin Oxide (In2O3/SnO2) Sputtering...
Indium Tin Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Indium Tin Oxide Sputtering Target at competitive prices.
Indium Zinc Oxide (In2O3/ZnO) Sputtering...
Indium Zinc Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Indium Zinc Oxide Sputtering Target at competitive prices.
Iron Oxide (Fe2O3) Sputtering Target
Iron Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Iron Oxide Sputtering Target at competitive prices.
$184.00In StockBlack Iron Oxide (Fe3O4) Sputtering Target
Black Iron Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Black Iron Oxide Sputtering Target at competitive prices.
$249.00In Stock
Lanthanum Calcium Manganate...
Lanthanum Calcium Manganate Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lanthanum Calcium Manganate Sputtering Target at competitive prices.
Lanthanum Manganate (LaMnO3) Sputtering...
Lanthanum Manganate Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lanthanum Manganate Sputtering Target at competitive prices.
Lanthanum Nickel Oxide (LaNiO3) Sputtering...
Lanthanum Nickel Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lanthanum Nickel Oxide Sputtering Target at competitive prices.
Lanthanum Niobium Oxide (LaNbO3)...
Lanthanum Niobium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lanthanum Niobium Oxide Sputtering Target at competitive prices.
Lanthanum Oxide (La2O3) Sputtering Target
Lanthanum Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lanthanum Oxide Sputtering Target at competitive prices.
$294.00In Stock
Lanthanum Titanate (LaTiO3) Sputtering Target
Lanthanum Titanate Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lanthanum Titanate Sputtering Target at competitive prices.
