Indium Iron Oxide (InFe2O4) Sputtering Target

HM provides high-quality Indium Iron Oxide Sputtering Target for research and industry purposes at competitive prices. We can provide Indium Iron Oxide Sputtering Target with different purity, size, and density according to your requirements.

• High purity and density
• Low particle
• Uniform film thickness distribution
• High efficiency in the use

Indium Iron Oxide Sputtering Target Dimensions

Specification note: Specify InFe2O4 composition, purity, target shape, diameter or plate size, thickness, density, backing plate, bonding and quantity.

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Indium Iron Oxide Sputtering Target Applications

• Oxide thin films, electronic material coatings, PVD research and specialty ceramic target development.

Indium Iron Oxide Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Indium Iron Oxide Sputtering Target Delivery and Packaging

Packaging note: Targets should be protected with clean packing, moisture control and documentation when required.

The Lead time of the Indium Iron Oxide Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.