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Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Lanthanum Vanadium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lanthanum Vanadium Oxide Sputtering Target at competitive prices.
Lead Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lead Oxide Sputtering Target at competitive prices.
Lead Titanate Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lead Titanate Sputtering Target at competitive prices.
Lead Lanthanum Zirconium Titanate Sputtering Target Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lead Lanthanum Zirconium Titanate Sputtering Target Sputtering Target at competitive prices.
Lead Zirconium Titanate Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lead Zirconium Titanate Sputtering Target at competitive prices.
Lithium Cobalt Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lithium Cobalt Oxide Sputtering Target at competitive prices.
Lithium Phosphate Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Lithium Phosphate Sputtering Target at competitive prices.
Lutetium Oxide (Lu2O3) Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. Heeger Materials (HM) is a professional supplier of high-quality Lutetium Oxide (Lu2O3) Sputtering Target. The purity and dimension can be customized upon request.
Manganese Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Manganese Oxide Sputtering Target at competitive prices.
Molybdenum Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Molybdenum Oxide Sputtering Target at competitive prices.
Neodymium Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Neodymium Oxide Sputtering Target at competitive prices.
Praseodymium Calcium Manganate Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Praseodymium Calcium Manganate Sputtering Target at competitive prices.