Lutetium Oxide (Lu2O3) Sputtering...
Lutetium Oxide (Lu2O3) Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. Heeger Materials (HM) is a professional supplier of high-quality Lutetium Oxide (Lu2O3) Sputtering Target. The purity and dimension can be customized upon request.
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|Purity||99.9% - 99.99%|
Lutetium Oxide (Lu2O3) Sputtering Target has versatility and unique properties, making it an attractive material for various thin film deposition applications. HM provides high-quality Lutetium Oxide (Lu2O3) Sputtering Target at competitive prices.
Circular Sputtering Targets
up to 21”
Rectangular Sputtering Targets
Width x Length
5” x 12”
5” x 15”
5” x 20”
5” x 22”
6” x 20”
General requirements include size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Lutetium Oxide (Lu2O3) Sputtering Target has a lead time of 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.
Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.