Lutetium Oxide (Lu2O3) Sputtering Target has versatility and unique properties, making it an attractive material for various thin film deposition applications. HM provides high-quality Lutetium Oxide (Lu2O3) Sputtering Target at competitive prices. 

Lutetium Oxide (Lu2O3) Sputtering Target General Properties

• CAS: 12032-20-1
• EINECS No.: 234-764-3
• Formula: Lu2O3
• Molecular weight: 397.93 g/mol
• Melting point: 2490 ℃ (4514 °F)
• Boiling point: 3980 ℃ (7196 °F)
• Density: 9.42 g/cm3
• High purity and density
• Low particle
• Uniform film thickness distribution
• High efficiency in the use

Lutetium Oxide (Lu2O3) Sputtering Target Dimensions

Sputtering Targets Requirements

General requirements include size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Lutetium Oxide (Lu2O3) Sputtering Target Applications

• Used in the electronics and information industry.
• Used in the glass coating field.
• Used in wear-resistant materials.
• Used in high-temperature corrosion resistance.
• Used in high-grade decorative goods.

Lutetium Oxide (Lu2O3) Sputtering Target Delivery and Packaging

Lutetium Oxide (Lu2O3) Sputtering Target has a lead time of 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.