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High-purity Tantalum (Ta) Evaporation...
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High-purity Tantalum (Ta) Evaporation Materials for e-beam evaporation and PVD thin-film deposition. Available as pellets, pieces, slugs, wire, rods, and custom forms with purity up to 99.9999%. Suitable for electronic, optical, semiconductor, and research coatings. Custom sizes available. Request a quote.
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Availability date: 08/12/2020
| Density | 16.6 g/cc |
| Melting Piont | 3017 °C |
| Appearance | Gray Blue, Metallic |
| Symbol | Ta |
| Purity | 99.95% |
| Size | Pellet / Wire / Rod / Slug / Tablet / Customized |
| CAS | 7440-25-7 |
| Synonyms | Ta Pellets / Ta Wire / Ta Pieces / Tantalum Pellets / Tantalum Wire / Tantalum Pieces / Tantalum Evaporation Material / Ta Evaporation Material / Ta Evapor Materials / Tantalum Evapor Materials |
Heeger Materials supplies high-purity Tantalum (Ta) Evaporation Materials for electron-beam evaporation, PVD thin-film deposition, semiconductor research, optical coatings, electronic devices, and advanced materials research.
Tantalum evaporation materials are available in multiple forms, including pellets, pieces, slugs, wire, rods, tablets, and custom geometries, allowing the material form and dimensions to be matched to different evaporation systems and source configurations.
Purity levels from 99.9% to ultra-high-purity grades are available depending on product form and specifications. Custom dimensions, purity, quantity, and packaging requirements can be reviewed according to customer needs.
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Tantalum evaporation pellets provide a convenient source form for vacuum deposition and electron-beam evaporation systems.
Pellet dimensions and purity can be customized according to evaporation equipment and process requirements.
Tantalum pieces and slugs are available in standard and custom dimensions for e-beam evaporation and thin-film deposition.
Custom cut sizes can be reviewed according to crucible, hearth, pocket, or evaporation-source requirements.
High-purity tantalum evaporation wire is available in custom diameters and lengths for suitable vacuum-deposition and research applications.
Tantalum rod, tablets, and other custom evaporation-source geometries can be supplied according to customer specifications.
If you require a specific shape or dimension, send us your drawing or evaporation-source dimensions for review.
Tantalum is a refractory metal with a very high melting point and relatively low vapor pressure. These characteristics are important when selecting an appropriate evaporation method.
| Vapor Pressure | Approx. Temperature |
|---|---|
| 10⁻⁸ Torr | 1960°C |
| 10⁻⁶ Torr | 2240°C |
| 10⁻⁴ Torr | 2590°C |
Because of the high temperatures required to achieve useful vapor pressure, electron-beam evaporation is generally a suitable method for tantalum deposition.
Heeger Materials' Thin Film Evaporation Guide lists e-beam evaporation as an excellent method for Ta and notes that high vacuum is important for mitigating oxygen incorporation in deposited films.
Tantalum's high melting point makes e-beam evaporation particularly useful because the electron beam can deliver concentrated energy directly to the evaporation material.
For tantalum deposition, process considerations may include:
Actual deposition conditions should be optimized for the specific evaporation system and desired thin-film characteristics.
Purity is an important consideration for evaporation materials because impurities in the source material can affect deposited-film composition and performance.
Higher-purity tantalum may be appropriate for demanding semiconductor, electronic, optical, and research applications where contamination control is critical.
When requesting material, specify both the required nominal purity and any critical individual impurity limits.
For high-purity requirements, request a lot-specific Certificate of Analysis (COA).
High-purity tantalum evaporation materials can be used in research and manufacturing involving tantalum thin films for semiconductor and electronic applications.
Tantalum can be deposited in thin-film systems for selected optical and functional coating applications.
Tantalum pellets, pieces, and slugs can be used as source materials in vacuum PVD systems where high-purity tantalum films are required.
Due to tantalum's high melting point, e-beam evaporation is an important deposition route for tantalum source materials.
Small quantities and custom tantalum evaporation forms are suitable for universities, laboratories, coating development, prototype deposition, and materials research.
When selecting tantalum evaporation material, consider:
Purity
Specify the required purity and any critical impurity limits.
Material Form
Choose pellets, pieces, slugs, wire, rod, tablets, or a custom geometry according to the evaporation source.
Dimensions
Specify pellet size, piece dimensions, slug diameter and length, wire diameter, or other required dimensions.
Evaporation Method
Specify e-beam or another applicable vacuum-deposition method.
Quantity
Standard quantities currently include 100 g, 250 g, 500 g, and 1 kg, with custom quantities available.
Documentation
Specify whether COA, SDS/MSDS, or other technical documentation is required.
Heeger Materials can review custom tantalum evaporation-source requirements, including:
Send us your required Purity + Form + Size + Quantity for quotation.
Heeger Materials supplies high-purity evaporation materials for research and industrial thin-film deposition.
Our tantalum evaporation-material capabilities include:
For material comparison or adjacent product forms, browse all products, deposition materials, technical ceramics and Evaporation Materials.
Heeger Materials supplies multiple purity levels of tantalum evaporation material. Available purity depends on material form, dimensions, quantity, and specific impurity requirements. Please specify the required purity and critical impurity limits when requesting a quotation.
Available forms include tantalum pellets, pieces, slugs, wire, rods, tablets, and custom geometries. Custom dimensions can be reviewed according to your evaporation-source requirements.
Yes. Because tantalum has a very high melting point, electron-beam evaporation is a suitable deposition method for tantalum. Appropriate vacuum level, source configuration, power, and deposition parameters should be selected for the specific system.
Yes. Pellet, piece, slug, wire, rod, and other dimensions can be customized according to customer requirements.
Please provide the required purity, material form, dimensions, quantity, evaporation method, and any critical impurity or packaging requirements.
Yes. Material certification/COA and SDS/MSDS documentation can be supplied as applicable. For high-purity material, request lot-specific chemical composition data with your order.
Material | Tantalum |
Atomic Weight | 180.94788 |
Color/Appearance | Gray Blue, Metallic |
Thermal Conductivity | 57 W/m.K |
Melting Point (°C) | 3,017 |
Coefficient of Thermal Expansion | 6.3 x 10-6/K |
Theoretical Density (g/cc) | 16.6 |
Z Ratio | 0.262 |
Temp. (°C) for Given Vap. Press. (Torr) | 10^-8: 1,960 10^-6: 2,240 10^-4: 2,590 |
Packing: The Tantalum (Ta) Evaporation Material are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 3-20 days.
Heeger Materials Inc., a professional supplier, and manufacturer of high-quality Evaporation Material products including Tantalum (Ta) Evaporation Material leverages extensive expertise in supply and export to offer competitive prices. We provide customized solutions to meet specific requirements, ensuring exceptional quality and customer satisfaction.
Heeger Materials Inc. was established in 2016 in Colorado, USA. We are a specialized supplier of premium-grade metals, alloys, ceramics, powders, and other materials catering to research, development, and large-scale industrial production in scientific and industrial sectors.

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