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Sale! Nickel Chromium Aluminum (Ni/Cr/Al) Sputtering Target-Heeger Materials Inc View larger

Nickel Chromium Aluminum (Ni/Cr/Al) Sputtering Target

HTST363

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Nickel Chromium Aluminum Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Nickel Chromium Aluminum Sputtering Target at competitive prices.

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Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Data sheet

ShapeDisc/Rectangular/Tube
BondingUnbonding/Bonding
SymbolNi/Cr/Al
Purity99.9% - 99.95%

More info

HM provides high-quality Nickel Chromium Aluminum Sputtering Target for research and industry purposes at competitive prices. We can provide Nickel Chromium Aluminum Sputtering Target with different purity, size, and density according to your requirements.

  • High purity and density
  • Low particle
  • Uniform film thickness distribution
  • High efficiency in the use

Nickel Chromium Aluminum Sputtering Target Dimensions

Circular Sputtering Targets

Diameter

1.0”

2.0”

3.0”

4.0”

5.0”

6.0”

up to 21”

Rectangular Sputtering Targets

Width x Length

5” x 12”

5” x 15”

5” x 20”

5” x 22”

6” x 20”

Thickness

0.125”, 0.25”

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Nickel Chromium Aluminum Sputtering Target Applications

Nickel Chromium Aluminum Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Nickel Chromium Aluminum Sputtering Target Delivery and Packaging

The Lead time of the Nickel Chromium Aluminum Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.

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