Sputtering Targets
- Products
- Deposition Materials
- Refractory Metals
- Rare Earth Materials
- Powder
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- Lanthanum Hexaboride (LaB6) Materials
- Pyrolytic Boron Nitride (PBN) Products
- Boron Nitride (BN) Products
- Alumina Ceramics (Al2O3)
- Aluminum Nitride (AlN) Products
- Silicon NItride (Si3N4) Ceramics
- Silicon Carbide (SiC) Ceramics
- Graphite Products
- Zirconia Ceramic
- MAX Phase Ceramic Materials
- Boron Carbide Ceramics (B4C)
- Magnesium Oxide Ceramics (MgO)
- Quartz Ceramics
- Macor Machinable Glass Ceramic
- Beryllium Oxide (BeO) Ceramics
- Piezoelectric Ceramics
- High Purity Materials
- Precious Metals
- Chemicals
- Crystals ＆ Substrates
- Applications
- Other
American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Sputtering Targets There are 340 products.
N-type Silicon (Si) Sputtering Target
N-type Silicon Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality N-type Silicon Sputtering Target at competitive prices.
P-type Silicon (Si) Sputtering Target
P-type Silicon Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality P-type Silicon Sputtering Target at competitive prices.
Pure Silicon (Si) Sputtering Target
Pure Silicon Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Pure Silicon Sputtering Target at competitive prices.
Strontium (Sr) Sputtering Target
Strontium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Strontium Sputtering Target at competitive prices.
$484.00In Stock
Tellurium (Te) Sputtering Target
碲溅射靶材可用于半导体、化学气相沉积 (CVD)、物理气相沉积 (PVD) 显示器和光学应用。我们以极具竞争力的价格供应高品质的碲溅射靶材。
Terbium (Tb) Sputtering Target
Terbium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Terbium Sputtering Target at competitive prices.
Thulium (Tm) Sputtering Target
Thulium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Thulium Sputtering Target at competitive prices.
Titanium (Ti) Sputtering Target
Titanium Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) displays, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Titanium Sputtering Targets, offering competitive prices and customized solutions to meet specific requirements.
$474.00In Stock
Yttrium (Y) Sputtering Target
Yttrium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Yttrium Sputtering Target at competitive prices.
Aluminum Chromium (Al/Cr) Sputtering Target
Aluminum Chromium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Aluminum Chromium Sputtering Target at competitive prices.
Aluminum Cobalt (Al/Co) Sputtering Target
Aluminum Cobalt Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Aluminum Cobalt Sputtering Target at competitive prices.
Aluminum Magnesium (Al/Mg) Sputtering Target
Aluminum Magnesium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Aluminum Magnesium Sputtering Target at competitive prices.
