Titanium (Ti) General Information

Titanium, a lustrous silvery-white metal, is widely used in products like watches, drill bits, laptops, and bicycles. It has a melting point of 1,660°C, a density of 4.5 g/cc, and a vapor pressure of 10^-4 Torr at 1,453°C. This durable material is easily fabricated with heat.

HM provides high-quality Titanium Sputtering Targets at competitive prices for research and industry purposes. We can provide Titanium Sputtering targets with different purity, size, and density per your requirements.

• High purity and density
• Low particle
• Uniform film thickness distribution
• High efficiency in the use

Titanium Sputtering Target Specifications

Titanium Sputtering Target Dimensions

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Titanium Sputtering Target Applications

• Due to the high cost of pure titanium, its applications are quite limited, primarily used as an adsorption material in semiconductors and ultra-high vacuum systems.
• When sputtered to create interconnections in LSI, VLSI, and ULSI, it helps make these components exceptionally light, thin, small, and densely packed.
• High-purity titanium targets can also serve as barrier layer metals.

Titanium Sputtering Target Delivery and Packaging

The Lead time of the Titanium Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.