Heeger Materials Inc is a leading supplier of high-purity materials including sputtering targets and evaporation materials. We offer pure elements, compounds, alloys, ceramics, intermetallics, and mixtures in a sort of shapes, sizes, and purities for both R&D and Production applications.
We will contact you with the price and availability in 24 hours.
Heeger Materials Inc is a leading supplier of high-purity materials including sputtering targets and evaporation materials. We offer pure elements, compounds, alloys, ceramics, intermetallics, and mixtures in a sort of shapes, sizes, and purities for both R&D and Production applications.
We will contact you with the price and availability in 24 hours.
Deposition Materials There are 289 products.
Subcategories
Sputtering Targets
Heeger Materials Inc is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Evaporation Materials
Heeger Materials Inc is a supplier of high-purity evaporation materials at a competitive price. Various evaporation materials are in stock and customized services are also available.
We will contact you with the price and availability of these items in 24 hours.
Target Bonding Service
Heeger Materials Inc provides Indium-based Metallic Bonding, Elastomer Bonding, and OFHC Copper Backing Plates at a competitive price. The thermal and mechanical integrity of the bond between a sputtering target and its backing plate is essential to ensure optimum sputtering performance.
Titanium Boride (TiB2) Sputtering Target
Titanium Boride Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Titanium Boride Sputtering Target at competitive prices.
Antimony (Sb) Sputtering Target
Antimony Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Antimony Sputtering Target at competitive prices.
$433.66In StockCadmium (Cd) Sputtering Target
Cadmium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Cadmium Sputtering Target at competitive prices.
$231.53In StockTantalum (Ta) Sputtering Target
Tantalum Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Tantalum Sputtering Target at competitive prices.
$147.00In StockTantalum Oxide (Ta2O5) Sputtering Target
Tantalum Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Tantalum Oxide Sputtering Target at competitive prices.
$385.88In StockNiobium (Nb) Sputtering Target
Niobium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Niobium Sputtering Target at competitive prices.
$98.55In StockNiobium Oxide (Nb2O5) Sputtering Target
Niobium Oxide Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Niobium Oxide Sputtering Target at competitive prices.
$125.00In StockTungsten (W) Sputtering Target
Tungsten Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Tungsten Sputtering Target at competitive prices.
$106.58In StockTungsten Oxide (WO3) Sputtering Target
Tungsten Oxide Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Tungsten Oxide Sputtering Target at competitive prices.
$529.20In StockAluminum-doped zinc oxide (AZO)...
Aluminum-doped zinc oxide (AZO) Evaporation Material is made of ZnO / Al2O3, 98/2 WT%, which can be used for electron beam and thermal evaporation. The available shapes are pellets and shots. Customized purity and dimensions are available. HM is a leading manufacturer and supplier of various evaporation materials.
$349.00In StockGraphite (C) Evaporation Materials
Graphite (C) Evaporation Material is made of high purity carbon, which can be used for electron beam and thermal evaporation. The available shapes are pellets and shots. Customized purity and dimensions are available. HM is a leading manufacturer and supplier of various evaporation materials.
$290.00In StockCuprous Oxide (Cu2O) Evaporation Materials
Cuprous Oxide (Cu2O) Evaporation Material is made of high purity Cu2O powder, which can be used for electron beam and thermal evaporation. The available shapes are pellets and shots. Customized purity and dimensions are available. HM is a leading manufacturer and supplier of various evaporation materials.
$290.00In Stock
