American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
American Manufacturers, Factory, Suppliers | Heeger Materials
Heeger Materials Inc. is a supplier of high-purity sputtering targets. Included pure metal and alloy, oxides, fluorides, and nitrides, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.
We will contact you with the price and availability of these items in 24 hours.
Sputtering Targets There are 339 products.
Copper Nickel (Cu/Ni) Sputtering Target
Copper Nickel Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Copper Nickel Sputtering Target at competitive prices.
Copper Zinc (Cu/Zn) Sputtering Target
Copper Zinc Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Copper Zinc Sputtering Target at competitive prices.
Iron Aluminum (Fe/Al) Sputtering Target
Iron Aluminum Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Iron Aluminum Sputtering Target at competitive prices.
Iron Chromium (Fe/Cr) Sputtering Target
Iron Chromium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Iron Chromium Sputtering Target at competitive prices.
Iron Manganese (Fe/Mn) Sputtering Target
Iron Manganese Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Iron Manganese Sputtering Target at competitive prices.
Iron Nickel (Fe/Ni) Sputtering Target
Iron Nickel Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Iron Nickel Sputtering Target, offering competitive prices and customized solutions to meet specific requirements.
Manganese Copper (Mn/Cu) Sputtering Target
Manganese Copper Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Manganese Copper Sputtering Target at competitive prices.
Manganese Nickel (Mn/Ni) Sputtering Target
Manganese Nickel Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Manganese Nickel Sputtering Target at competitive prices.
Molybdenum Aluminium (Mo/Al) Sputtering...
Molybdenum Aluminium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Molybdenum Aluminium Sputtering Target at competitive prices.
Molybdenum Chromium (Mo/Cr) Sputtering Target
Molybdenum Chromium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Molybdenum Chromium Sputtering Target at competitive prices.
Molybdenum Titanium (Mo/Ti) Sputtering Target
Molybdenum Titanium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Molybdenum Titanium Sputtering Target at competitive prices.
Nickel Chromium Aluminum (Ni/Cr/Al)...
Nickel Chromium Aluminum Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Nickel Chromium Aluminum Sputtering Target at competitive prices.