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Sale! Iron Nickel (Fe/Ni) Sputtering Target-Heeger Materials Inc View larger

Iron Nickel (Fe/Ni) Sputtering Target

HTST357

New product

Iron Nickel Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Iron Nickel Sputtering Target, offering competitive prices and customized solutions to meet specific requirements.

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Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Data sheet

ShapeDisc/Rectangular/Tube
BondingUnbonding/Bonding
SymbolFe/Ni
Purity99.9% - 99.99%

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Iron Nickel (Fe/Ni) General Information

Nickel is a hard, silvery-white metal with a density of 8.91 g/cc, a melting point of 1,453°C, and a vapor pressure of 10⁻⁴ Torr at 1,262°C. Iron is a soft, gray metal with a density of 7.86 g/cc, a melting point of 1,535°C, and a vapor pressure of 10⁻⁴ Torr at 1,180°C. Iron reacts with air to form rust, exposing surfaces to further oxidation. Both nickel and iron are common in the earth's core and are widely used in industry. They are ferromagnetic, ductile, and conduct heat and electricity well. Nickel/iron alloys, found in meteorites, are often evaporated in a vacuum to create films for semiconductors and magnetic storage media.

HM provides high-quality Iron Nickel Sputtering Targets at competitive prices for research and industry purposes. We can provide Iron Nickel Sputtering Targets with different purity, sizes, and densities per your requirements.

  • High purity and density
  • Low particle
  • Uniform film thickness distribution
  • High efficiency in the use

Iron Nickel Sputtering Target Dimensions

Circular Sputtering Targets

Diameter

1.0”

2.0”

3.0”

4.0”

5.0”

6.0”

up to 21”

Rectangular Sputtering Targets

Width x Length

5” x 12”

5” x 15”

5” x 20”

5” x 22”

6” x 20”

Thickness

0.125”, 0.25”

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Iron Nickel Sputtering Target Applications

Nickel-iron alloy targets contain 20%-60% nickel and have a melting point between 1,430°C and 1,480°C, with a density of 8.1-8.7 g/cm³. These alloys are low-frequency soft magnetic materials with high magnetic permeability and low coercivity in weak magnetic fields. Initially used in telecommunication, nickel-iron alloys have seen significant improvements through thermal treatment and vacuum smelting. A nickel-iron alloy with 78% nickel has a magnetic permeability in weak magnetic fields approximately 10-20 times higher than that of silicon steel, making it widely used in sensitive relays, magnetic shielding, telephone and radio transformers, precision AC and DC instruments, and current transformers. Adding elements such as molybdenum, manganese, cobalt, copper, or chromium to nickel-iron alloys can produce ternary or quaternary alloys with greater initial magnetic permeability (Ui) and higher magnetic permeability (Um).

Iron Nickel Sputtering Target Delivery and Packaging

The Lead time of the Iron Nickel Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.

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