Silicon Dioxide/Silicon Epitaxial Wafer | SiO2/Si Wafer

Data sheet

Density	2.4 g/cm3
Materials	SiO2/Si Wafer
Melting Piont	1420°C

More info

Silicon Dioxide/Silicon (SiO2/Si) Epitaxial Wafer is a key material in semiconductor processing, featuring a high-quality silicon dioxide layer grown on a silicon substrate. This structure enhances electrical insulation, surface passivation, and device performance, making it essential for microelectronics, MEMS, and integrated circuit fabrication. With precise thickness control and excellent uniformity, these wafers support advanced research and industrial applications. Heeger Materials provides high-quality SiO2/Si Wafers with reliable performance for diverse technological needs.

Silicon Dioxide/Silicon Epitaxial Wafer | SiO2/Si Wafer

Silicon Dioxide/Silicon Epitaxial Wafer Properties

Crystal Structure	Face-centered cubic
Melting Point (°C)	1420
Density (g/cm³)	2.4
Type	N or P	N	P
Doping	-	P (Phosphorus)	B (Boron)
Film Thickness	300–500 nm
Resistivity (Ω·cm)	>1000	10⁻³–10⁴	10⁻³–10⁴
EPD (∕cm²)	≤100	≤100	≤100
Oxygen Content (∕cm³)	≤1–1.8×10¹⁸	≤1–1.8×10¹⁸	≤1–1.8×10¹⁸
Carbon Content (∕cm³)	≤5×10¹⁶	≤5×10¹⁶	≤5×10¹⁶

Silicon Dioxide/Silicon Epitaxial Wafer Specifications

Dimensions	10×10mm, 15×15mm, Dia50.8mm, Dia76.2mm, Dia100mm
Customization	Substrates can be customized to special orientations and dimensions as per customer requirements.
Thickness	0.3–0.5mm, 1.0mm
Dimension Tolerance	<±0.1mm
Thickness Tolerance	<±0.015mm (can reach <±0.005mm for special requirements)
Polishing	Single-side or double-side polished
Crystal Orientation Accuracy	±0.5°
Edge Orientation Accuracy	2° (can achieve <1° for special requirements)
Orientations	<100>, <110>, <111>, etc.

Silicon Dioxide/Silicon Epitaxial Wafer Applications

Semiconductor Device Fabrication: Used as an insulating layer in MOSFETs, diodes, and other semiconductor components to enhance performance and reliability.
Microelectromechanical Systems (MEMS): Essential for MEMS sensors and actuators, providing structural integrity and electrical insulation.
Integrated Circuits (ICs): Supports high-performance chip manufacturing by enabling precise dielectric layer formation and surface passivation.
Optoelectronics: Utilized in photonic devices, waveguides, and optical coatings for improved light transmission and signal processing.
Advanced Research and Development: Applied in nanotechnology, quantum computing, and experimental semiconductor studies requiring high-purity and well-controlled materials.

Silicon Dioxide/Silicon Epitaxial Wafer Packing And Shipping

Silicon Dioxide/Silicon (SiO2/Si) Epitaxial Wafer will be securely packaged in sturdy containers with cushioning materials to prevent movement or damage during shipping. This careful packaging ensures that the product arrives in perfect condition, maintaining its high-quality standards throughout the delivery process.

Where to Buy Silicon Dioxide/Silicon Epitaxial Wafer in Bulk?

Heeger Materials Inc., a professional supplier and manufacturer of high-quality Epitaxial Thin Film products including Silicon Dioxide/Silicon (SiO2/Si) Epitaxial Wafer, leverages extensive expertise in supply and export to offer competitive prices. We provide customized solutions to meet specific requirements, ensuring exceptional quality and customer satisfaction.

Heeger Materials Inc. was established in 2016 in Colorado, USA. We specialize in premium-grade metals, alloys, ceramics, powders, and other materials catering to research, development, and large-scale industrial production in scientific and industrial sectors.

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