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Rhenium (Re) Heater for MOCVD

Condition: New product

Rhenium (Re) Heater for MOCVD is a metal resistance heating element used for the metal-organic chemical vapor deposition (MOCVD) process. Heeger Materials can provide the best Rhenium (Re) Heater at high quality and competitive prices. The shapes and dimensions can be tailored according to drawings to meet specific requirements.

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Data sheet

Materials	Rhenium (Re)
Purity	99.95%

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Rhenium (Re) Heater for MOCVD can uniformly heat the substrate under high temperature, high pressure, and high gas flow conditions, promoting the growth of thin film materials.

Rhenium (Re) Heater Processing Accuracy Parameters

Main Materials	Processing Range	Dimensional Accuracy (mm)	Shape Accuracy (mm)	Position Accuracy (mm)	Finish (Ra, μm)
HM-Re (≥99.95%)	0.00-5.00	±0.003	0.01	0.005	0.2-0.4
	5.01-15.00	±0.005	0.015	0.006	0.4
	15.01-30	±0.008	0.02	0.007	0.4
	30.01-100	±0.010	0.025	0.008	0.6
	>100	±0.0127	0.030	0.010	0.6

Rhenium (Re) Heater Applications

Used in the epitaxial growth of semiconductor materials.
Used in the deposition of ultra-thin films on substrates.
Used in the doping process.
Used in the growth of III-V compound semiconductors like gallium arsenide (GaAs), indium phosphide (InP), and gallium nitride (GaN).

Rhenium (Re) Heater Packing

Rhenium (Re) Heater is carefully packaged with adhesive-free surface protection tape and cardboard boxes to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

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