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Tin Sputtering Targets can be used in...
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Tin Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) displays, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Tin Sputtering targets, offering competitive prices and customized solutions to meet specific requirements.
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Shape | Disc/Rectangular/Tube |
Bonding | Unbonding/Bonding |
Symbol | Sn |
Purity | 99.9% |
Tin sputtering targets are silver-gray metal targets composed of high-purity tin. Due to its excellent chemical resistance, tin is used as a coating for other metals to prevent corrosion, with the coating of steel sheets for tinplate being a significant application. Tin is widely used in the manufacture of solder, where it forms alloys with other elements to produce solders with various properties. Tin is also a component in bronze, pewter, certain bearing materials, and low-melting-point alloys.
HM provides high-quality Tin Sputtering targets at competitive prices for research and industry purposes. We can provide Tin Sputtering Targets with different purity, size, and density per your requirements.
Material Type | Tin | Coefficient of Thermal Expansion | 22 x 10-6/K |
Symbol | Sn | Theoretical Density (g/cc) | 7.28 |
Atomic Weight | 118.71 | Z Ratio | 0.724 |
Atomic Number | 50 | Sputter | DC |
Color/Appearance | Silvery Lustrous Gray, Metallic | Max Power Density (Watts/Square Inch) | 10* |
Thermal Conductivity | 66.6 W/m.K | Type of Bond | Elastomer |
Melting Point (°C) | 232 | Comments | It wets Mo low sputter power. Use Ta liner in E-beam guns. Low Melting Point materials are not ideal for sputtering. |
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” |
Thickness | 0.125”, 0.25” |
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Tin Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
The Lead time of the Tin Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.
Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.
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