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Vanadium (V) Sputtering Target

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Vanadium Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) displays, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Vanadium Sputtering targets, offering competitive prices and customized solutions to meet specific requirements.

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$143.33

  • 99.5%




Data sheet

ShapeDisc/Rectangular/Tube
BondingUnbonding/Bonding
SymbolV
Purity99.5%

More info

Vanadium, with the symbol V, is a silver-gray metal in group VB of the periodic table, with an atomic number of 23. It is ductile, hard, and non-magnetic, with excellent resistance to hydrochloric and sulfuric acids, surpassing most stainless steels in resistance to air, salt, and water corrosion. Vanadium does not oxidize in air and dissolves in hydrofluoric acid, nitric acid, and aqua regia. High-purity vanadium is used in hydrogen storage alloys, hydrogen separation membranes, high-temperature superconductors, and as protective materials and heat release components in fast breeder reactor fuel rods due to its hydrogen storage capacity, high-temperature superconductivity, small neutron absorption cross-section, and resistance to liquid sodium corrosion.

HM provides high-quality Vanadium Sputtering Targets for research and industry purposes at competitive prices. We can provide Vanadium Sputtering Targets with different purity, size, and density per your requirements.

  • High purity and density
  • Low particle
  • Uniform film thickness distribution
  • High efficiency in the use

Vanadium Sputtering Target Specifications

Material Type

Vanadium

Coefficient of Thermal Expansion

8.4 x 10-6/K

Symbol

V

Theoretical Density (g/cc)

6.11

Atomic Weight

50.9415

Z Ratio

0.53

Atomic Number

23

Sputter

DC

Color/Appearance

Silvery Gray Metallic

Max Power Density (Watts/Square Inch)

50*

Thermal Conductivity

30.7 W/m.K

Type of Bond

Indium, Elastomer

Melting Point (°C)

1,890

Comments

Wets Mo. E-beam-evaporated films preferred.

Vanadium Sputtering Target Dimensions

Circular Sputtering Targets

Diameter

1.0”

2.0”

3.0”

4.0”

5.0”

6.0”

up to 21”

Rectangular Sputtering Targets

Width x Length

5” x 12”

5” x 15”

5” x 20”

5” x 22”

6” x 20”

Thickness

0.125”, 0.25”

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Vanadium Sputtering Target Applications

Vanadium Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Vanadium Sputtering Target Delivery and Packaging

The Lead time of the Vanadium Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.

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