Zirconium (Zr) General Information

Zirconium, a transition metal, has a density of 6.49 g/cc, a melting point of 1,852°C, and a vapor pressure of 10⁻⁴ Torr at 1,987°C. It appears silvery-white and is highly corrosion-resistant, making it valuable in the chemical industry. Zirconium is used in surgical tools, superconductive magnets, and nuclear reactor cladding, and serves as an alloying agent in steel. Its compound, zirconia, is a common diamond substitute in jewelry. Additionally, zirconium and its alloys are evaporated for use in optical coatings, semiconductors, and data storage devices.

HM provides high-quality Zirconium Sputtering Targets at competitive prices for research and industry purposes. We can provide Zirconium Sputtering Target with different purity, size, and density per your requirements.

• High purity and density
• Low particle
• Uniform film thickness distribution
• High efficiency in the use

Zirconium Sputtering Target Specifications

Zirconium Sputtering Target Dimensions

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Zirconium Sputtering Target Applications

Zirconium (Zr) Sputtering Targets are widely used in thin-film deposition, fuel cells, decoration, semiconductors, displays, LEDs, photovoltaic devices, functional coatings, optical data storage, automotive and architectural glass coatings, and optical communication.

Zirconium Sputtering Target Delivery and Packaging

The Lead time of the Zirconium Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.