Iridium (Ir) Sputtering Target can be...
Iridium (Ir) Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. HM specializes in producing high purity Iridium (Ir) Sputtering Targets with the highest possible density and the lowest prices.
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Iridium is a hard, brittle, lustrous, dense, transition metal of the platinum family. Iridium is the most corrosion-resistant material known. It is used in special alloys and forms an alloy with osmium, which is used for pen tips and compass bearings. It was used in making the standard meter bar, which is an alloy of 90% platinum and 10% iridium. It is also used for the contacts in spark plugs because of its high melting point and low reactivity. The anatomic mass of Iridium is 192.217 amu and the melting point is 2410.0 °C (2683.15 K, 4370.0 °F). The density is 22.5 and the crystal is Cubic. Besides sputtering targets, we also can offer Iridium powder, bar, sheet, foil, disc, ribbon, and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources, and other deposition materials are listed by material throughout the website.
Packing: The Iridium (Ir) Sputtering Targets are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you feedback in 24 hours.