Nickel (Ni) Sputtering Target

Nickel is a hard, lustrous, silvery-white metal with a density of 8.91 g/cc, a melting point of 1,453°C, and a vapor pressure of 10^-4 Torr at 1,262°C. Known for its malleability, ductility, and ferromagnetism, it resists tarnishing and is the second most abundant element in Earth's core after iron.

HM provides high-quality Nickel Sputtering targets for research and industry purposes at competitive prices. We can provide Nickel Sputtering Target with different purity, size, and density per your requirements.

• High purity and density
• Low particle
• Uniform film thickness distribution
• High efficiency in the use

Nickel Sputtering Target Specifications

Nickel Sputtering Target Dimensions

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Nickel Sputtering Target Applications

• Nickel Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
• When evaporated in a vacuum, it forms decorative coatings or solder layers and is sputtered for magnetic storage media, fuel cells, and sensors.

Nickel Sputtering Target Delivery and Packaging

The Lead time of the Nickel Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.