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Sale! Nickel Chromium (Ni/Cr) Sputtering Target-Heeger Materials Inc View larger

Nickel Chromium (Ni/Cr) Sputtering Target

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Nickel Chromium Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Nickel Chromium Sputtering Targets, offering competitive prices and customized solutions to meet specific requirements.

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Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

$99.23

  • 99.9%




Data sheet

ShapeDisc/Rectangular/Tube
BondingUnbonding/Bonding
SymbolNi/Cr
Purity99.9%

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HM provides high-quality Nickel Chromium Sputtering Targets at competitive prices for research and industry purposes. We can provide Nickel Chromium Sputtering Targets with different purity, size, and density per your requirements.

  • High purity and density
  • Low particle
  • Uniform film thickness distribution
  • High efficiency in the use

Nickel Chromium Sputtering Target Specifications

Material Type

Nichrome

Symbol

Ni/Cr

Melting Point (°C)

1,395

Theoretical Density (g/cc)

8.5

Nickel Chromium Sputtering Target Dimensions

Circular Sputtering Targets

Diameter

1.0”

2.0”

3.0”

4.0”

5.0”

6.0”

up to 21”

Rectangular Sputtering Targets

Width x Length

5” x 12”

5” x 15”

5” x 20”

5” x 22”

6” x 20”

Thickness

0.125”, 0.25”

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Nickel Chromium Sputtering Target Applications

  • Nickel-chromium alloy targets can be used to prepare resistance films that have high resistivity, low-temperature coefficient of resistance, high sensitivity coefficient, and minimal temperature dependence. Due to the ease of preparation, mature technology, and stable performance of nickel-chromium alloy resistance films, they are widely used.
  • In the coating industry, Ni-Cr binary alloy targets and films are extensively used for surface-enhancing coatings that offer wear resistance, friction reduction, heat resistance, and corrosion resistance, as well as in advanced technology sectors such as low-radiation glass, microelectronics, magnetic recording, semiconductors, and thin-film resistors.

Nickel Chromium Sputtering Target Delivery and Packaging

The Lead time of the Nickel Chromium Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.

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