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Nickel Chromium Sputtering Targets...
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Nickel Chromium Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Nickel Chromium Sputtering Targets, offering competitive prices and customized solutions to meet specific requirements.
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Shape | Disc/Rectangular/Tube |
Bonding | Unbonding/Bonding |
Symbol | Ni/Cr |
Purity | 99.9% |
HM provides high-quality Nickel Chromium Sputtering Targets at competitive prices for research and industry purposes. We can provide Nickel Chromium Sputtering Targets with different purity, size, and density per your requirements.
Material Type | Nichrome |
Symbol | Ni/Cr |
Melting Point (°C) | 1,395 |
Theoretical Density (g/cc) | 8.5 |
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” |
Thickness | 0.125”, 0.25” |
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
The Lead time of the Nickel Chromium Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.
Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.
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