Hafnium Silicide (HfSi2) Sputtering...
Hafnium Silicide (HfSi2) Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. HM specializes in producing high purity Hafnium Silicide (HfSi2) Sputtering Targets with the highest possible density and the lowest prices.
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Hafnium Silicide (HfSi2) Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources, and other deposition materials are listed by material throughout the website.
Packing: The Hafnium Silicide (HfSi2) Sputtering Target is vacuum-sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you feedback in 24 hours.