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Spherical nickel-coated tungsten...
SP-1303
New product
Spherical nickel-coated tungsten powder is prepared by chemical packaging process, with a high spherical degree, good mobility, high purity, large loose loading density, metal nickel content, and controllable coating thickness, and can be used in national defense, petrochemical, mechanical equipment, medical equipment, and other fields.
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Shape | Spherical / Ball Powder |
Particle Size | 15-45μm, 15-53μm, 45-75μm, 45-105μm, 75-150μm, customized |
Nickel is the most suitable plating material for tungsten alloy. Heeger Materials provides high-quality Spherical Nickel-coated Tungsten Powder at a competitive price, which can be used in Scientific research or industrial production.
5-25 μm,15-45μm,15-53μm,45-75μm,45-105μm,75-150μm.(Grain sizes can be customized at customer request)
High purity (≥ 99.9%), ultra-hypoxia (≤ 600ppm), high sphericity (≥ 98%), uniform particle size distribution, excellent mobility energy (≤ 8.0s/50g), high loose loading density (≥ 6.5g/cm3) and solid density (≥ 8.0g/cm3).
Applicable processes: Laser/electron beam additive manufacturing (SLM/EBM), laser direct deposition (DLD), powder thermal and other static pressure forming (HIP), metal injection forming (MIM), powder metallurgy (PM), laser melting application (LC), etc.
Spherical nickel-coated tungsten composite powder adopts tungsten carbide powder as raw material, the powder is prepared by chemical packaging process, with a high spherical degree, good mobility, high purity, large loose loading density, metal nickel content and controllable coating thickness, and can be used in national defense, petrochemical, mechanical equipment, medical equipment, and other fields.
Vacuum packaging, 1 kg/bags, 2 kg/bags; iron barrel lined plastic bags 25 kg/barrels; can be specially packaged according to the user requirements.
Chemical Composition | |||||
Element | Value(%) | Test Method | Element | Value(%) | Test Method |
W | Bal | ICP-AES | Sn | <0.001 | ICP-AES |
Ni | 2~25 | ICP-AES | Sb | <0.001 | ICP-AES |
Si | <0.005 | ICP-AES | Cu | <0.003 | ICP-AES |
Mg | <0.005 | ICP-AES | Ca | <0.001 | ICP-AES |
Mn | <0.004 | ICP-AES | Pt | <0.001 | ICP-AES |
Gas Impurities | |||||
Element | Value(%) | Element | Value(%) | ||
C | ≤0.005 | O | ≤0.06 | ||
N | ≤0.003 | P | ≤0.005 |
Density(g/cm³) | Hall Flow Rate(s/50g) | |
Apparent Density | Tap Density | Value |
≥6.5 | ≥8.0 | ≤8.0 |
Particle Size Description
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