Sale! Cobalt (Co) Sputtering Target-Heeger Materials Inc View larger

Cobalt (Co) Sputtering Target

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Cobalt Sputtering Targets can be used in semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD) displays, and optical applications. Heeger Materials is a professional supplier and manufacturer of high-quality Cobalt Sputtering Target, offering competitive prices and customized solutions to meet specific requirements.

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$197.00

  • 99.9%




Data sheet

ShapeDisc/Rectangular/Tube
BondingUnbonding/Bonding
SymbolCo
Purity99.9% - 99.99%

More info

Cobalt target material, cobalt is a shiny silver-gray metal with a melting point of 1495℃ and a specific gravity of 8.9. It is relatively hard and brittle. Cobalt is ferromagnetic and is similar to iron and nickel in terms of hardness, tensile strength, mechanical processing performance, thermodynamic properties, and electrochemical behavior. The magnetism disappears when heated to 1150℃. Cobalt with a purity of 99.9-99.99% has been widely used in the manufacture of magnetic materials and superalloys. Cobalt with a purity of 99.999% or even higher is used as a target material for advanced electronic components.

HM provides high-quality Cobalt Sputtering Target for research and industry purposes at competitive prices. We can provide Cobalt Sputtering Target with different purity, size, and density per your requirements.

  • High purity and density
  • Low particle
  • Uniform film thickness distribution
  • High efficiency in the use

Cobalt Sputtering Target Specifications

Material Type

Cobalt

Coefficient of Thermal Expansion

13.0 x 10-6/K

Symbol

Co

Theoretical Density (g/cc)

8.9

Atomic Weight

58.933195

Ferromagnetic

Magnetic Material

Atomic Number

27

Z Ratio

0.343

Color/Appearance

Lustrous, Metallic, Grayish Tinge

Sputter

DC

Thermal Conductivity

100 W/m.K

Max Power Density (Watts/Square Inch)

80*

Melting Point (°C)

1,495

Comments

Alloys with W/Ta/Mo.

Cobalt Sputtering Target Dimensions

Circular Sputtering Targets

Diameter

1.0”

2.0”

3.0”

4.0”

5.0”

6.0”

up to 21”

Rectangular Sputtering Targets

Width x Length

5” x 12”

5” x 15”

5” x 20”

5” x 22”

6” x 20”

Thickness

0.125”, 0.25”

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Cobalt Sputtering Target Applications

Cobalt Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Cobalt Sputtering Target Delivery and Packaging

The Lead time of the Cobalt Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.

Customized Sputtering Targets

Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.

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