Cobalt (Co) Sputtering Target can be...
Cobalt (Co) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Cobalt (Co) Sputtering Targets with the highest possible density and the lowest prices.
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|Purity||99.9% - 99.99%|
Cobalt is a hard ferromagnetic, silver-white metal which is similar to iron and nickel in its physical properties. Cobalt is used in many alloys (superalloys for parts in gas turbine aircrafr engines, corrosion resistant alloys, high-speed steels, cemented carbides), in magents and magnetic recording media, as catalysts for the petroleum and chemical industries. The antomic mass of Cobalt is 58.9332 amu and the melting point is 1495.0 °C (1768.15 K, 2723.0 °F). The density is 8.9 and the crystal is Hexagonal. Besides sputtering target, we also can offer Cobalt powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Packing: The Cobalt (Co) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you feedback in 24 hours.