Ruthenium (Ru) Sputtering Target can...
Ruthenium (Ru) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Ruthenium (Ru) Sputtering Targets with the highest possible density and the lowest prices.
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|Purity||99.9% - 99.95%|
Ruthenium is a shiny, silvery metal, which is mostly used in the electronics industry. Ruthenium oxide is used in the chemical industry to coat the anodes of electrochemical cells for chlorine production. Ruthenium is also used in catalysts for ammonia and acetic acid production. Ruthenium compounds can be used in solar cells, which turn light energy into electrical energy. The antomic mass of Ruthenium is 101.07 amu and the melting point is 2250.0 °C (2523.15 K, 4082.0 °F). The density is 12.2 and the crystal is Hexagonal. Besides sputtering target, we also can offer Ruthenium powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Packing: The Ruthenium (Ru) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you feedback in 24 hours.