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Ruthenium Sputtering Target can be...
HTST307
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Ruthenium Sputtering Target can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications. We are a supplier of high-quality Ruthenium Sputtering Target at competitive prices.
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Shape | Disc/Rectangular/Tube |
Bonding | Unbonding/Bonding |
Density | 12.3 g/cc |
Melting Piont | 2,310°C |
Appearance | Silvery White Metallic |
Symbol | Ru |
Molecular Weight | 101.07 g/mol |
Purity | 99.9% - 99.95% |
Ruthenium (Ru) Sputtering Targets are important for thin film deposition. They offer high purity and steady sputtering rates for even, uniform coatings. They are known for their strong resistance to corrosion and work well in tough conditions. They stick well to different substrates and make strong, high-quality films. Ruthenium Sputtering Targets are used in electronics, data storage, and sensors. They help improve thin film technology
Material Type | Ruthenium |
Symbol | Ru |
Atomic Weight | 101.07 |
Atomic Number | 44 |
Color/Appearance | Silvery White Metallic |
Thermal Conductivity | 120 W/m.K |
Melting Point (°C) | 2,310 |
Coefficient of Thermal Expansion | 6.4 x 10-6/K |
Theoretical Density (g/cc) | 12.3 |
Z Ratio | 0.182 |
Sputter | DC |
Max Power Density | 100* |
Type of Bond | Indium, Elastomer |
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” |
Thickness | 0.125”, 0.25” |
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
The Lead time of the Ruthenium Sputtering Target is 2-5 weeks. It will be packaged in a vacuum-sealed plastic bag with a moisture barrier. The MSDS and COA will be packed with the product.
Heeger Materials specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. Other magnetron sputtering targets, evaporation sources, and deposition materials are listed by material throughout the website.
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