Molybdenum Niobium Sputtering Target, Mo10Nb Alloy

HMST1349

New product

Molybdenum Niobium Alloy (Mo10Nb) sputtering target can be used in integrated circuits, and thin-film transistor liquid crystal display (TFT-LCD). 

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Data sheet

Diameter 1" -10"
Materials Mo10Nb

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Heeger Materials has been developing and successfully producing custom sputtering targets in Molybdenum Niobium Alloy (Mo10Nb) along with its other core competency materials: Tantalum (Ta), niobium (Nb), and tungsten (W).

Mo10Nb sputtering target     

Molybdenum Niobium Alloy Sputtering Target Specification

Product

Molybdenum Niobium Alloy Planar Sputtering Target

Size

Customized

Regular: 8-12mm T x 300mm x 600mm

purity

99.9%, 99.95%

Molybdenum Niobium Alloy Sputtering Target Packaging

Our Molybdenum Niobium Alloy Sputtering Target will be packed in a wooden case or carton supported with soft materials to ensure that the products thus packed will not shift inside the cases.

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