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Spherical tantalum (Ta) powder is...
ME73-SP
New product
Spherical tantalum (Ta) powder is made by RF plasma spheroidization, which has high purity hypoxia, high sphericity, smooth surface, no satellite, uniform particle size distribution, excellent flow performance, and high loose density and vibrational density.
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Shape | Spherical / Ball Powder |
Particle Size | 15-45μm, 15-53μm, 45-75μm, 45-105μm, 75-150μm, customized |
Purity | 99.99%/99.9%/99% |
Our spherical tantalum powder exhibits high sphericity, excellent flowability, high purity, large bulk density, and fully dense particles without hollow powders. The production methods mainly include RF plasma spheroidization and chemical vapor deposition (CVD). It is widely used in the fields of aviation, aerospace, nuclear energy, medical equipment, and other industries. We can provide customized particle sizes of spherical tantalum powder with low oxygen content according to customer demands, and our product has passed international certification.
We can not only provide relatively mature research on pure tantalum spherical powder but also provide tantalum-tungsten alloy spherical powder.
5-25μm, 15-45μm, 15-53μm, 45-75μm, 45-105μm, 75-150μm. (Various granularities can be customized according to customer requirements)
High purity (≥99.9%), low oxygen (≤300ppm), high sphericity (≥98%), smooth surface, no satellite spheres, uniform particle size distribution, and excellent flow properties (≤6.0s/50g), And high bulk density (≥9.5g/cm3) and tap density (≥10.5g/cm3).
Laser/electron beam additive manufacturing (SLM/EBM, 3D printing), laser direct deposition (DLD), powder hot isostatic pressing (HIP), metal injection molding (MIM), powder metallurgy (PM), laser cladding ( LC), and other processes.
Our products are available in vacuum-sealed bags of 1kg or 2kg. For larger quantities, we offer iron drums that are lined with a plastic bag and can hold up to 25kg. We also provide custom packaging options as per user specifications.
Chemical Composition - by ICP-AES | ||||||||
Element | Ta | Fe | Si | Ni | Ti | Mo | W | Nb |
Value (%) | ≥99.98 | <0.001 | <0.005 | <0.002 | <0.001 | <0.001 | <0.01 | <0.01 |
Gas Impurities | ||||||||
Element | C | H | O | N | ||||
Value (%) | </= 0.003 | </= 0.0015 | </= 0.03 | </= 0.004 |
Density (g/cm3) | Hall Flow Rate (s/50g) | |
Apparent Density | Tap Density | Value |
>9.5 | >10.5 | </= 6.5 |
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