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Spherical tantalum (Ta) powder is...
ME73-SP
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Spherical tantalum (Ta) powder is made by the Aerosol polarization method, which has high purity hypoxia, high sphericity, smooth surface, no satellite, uniform particle size distribution, excellent flow performance, and high loose density and vibrational density.
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Shape | Spherical / Ball Powder |
Particle Size | 15-45μm, 15-53μm, 45-75μm, 45-105μm, 75-150μm, customized |
Purity | 99.99%/99.9%/99% |
We provide spherical tantalum (Ta) powder with high purity hypoxia, high sphericity, smooth surface, no satellite, uniform particle size distribution, excellent flow performance, and high loose density and vibrational density. With its excellent biocompatibility, tantalum implants formed by 3D printing have the closest elastic modulus to human cartilage tissue and are the most ideal orthopedic implants. Spherical tantalum powder is suitable for laser/electron beam augmentation, hot isostatic pressing, laser cladding, hot/cold spraying, and so on.
We can not only provide relatively mature research on pure tantalum spherical powder but also provide tantalum-tungsten alloy spherical powder.
5-25μm, 15-45μm, 15-53μm, 45-75μm, 45-105μm, 75-150μm. (Various granularities can be customized according to customer requirements)
High purity (≥99.9%), low oxygen (≤300ppm), high sphericity (≥98%), smooth surface, no satellite spheres, uniform particle size distribution, and excellent flow properties (≤6.0s/50g), And high bulk density (≥9.5g/cm3) and tap density (≥10.5g/cm3).
Laser/electron beam additive manufacturing (SLM/EBM, 3D printing), laser direct deposition (DLD), powder hot isostatic pressing (HIP), metal injection molding (MIM), powder metallurgy (PM), laser cladding ( LC), and other processes.
Vacuum packaging, 1kg/bag, 2kg/bag; iron drum lined with plastic bag 25 kg/drum; special packaging is available according to user requirements.
Chemical Composition - by ICP-AES |
||||||||
Element |
Ta |
Fe |
Si |
Ni |
Ti |
Mo |
W |
Nb |
Value (%) |
≥99.98 |
<0.001 |
<0.005 |
<0.002 |
<0.001 |
<0.001 |
<0.01 |
<0.01 |
Gas Impurities |
||||||||
Element |
C |
H |
O |
N |
||||
Value (%) |
</= 0.003 |
</= 0.0015 |
</= 0.03 |
</= 0.004 |
Density (g/cm3) |
Hall Flow Rate (s/50g) |
|
Apparent Density |
Tap Density |
Value |
>9.5 |
>10.5 |
</= 6.5 |
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