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Tungsten (W) Heater for MOCVD

HTWW1142

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Tungsten (W) Heater for MOCVD is a metal resistance heating element used for the metal-organic chemical vapor deposition (MOCVD) process. Heeger Materials can provide top-quality Tungsten (W) Heater at competitive prices, with customized options for shapes and dimensions to meet specific requirements.

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Data sheet

MaterialsTungsten (W)
Purity99.95%

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Tungsten (W) Heater for MOCVD can uniformly heat the substrate under high temperature, high pressure, and high gas flow conditions, promoting the growth of thin film materials.

HM is a leading supplier of high-quality Tungsten and Molybdenum parts for high-temperature and vacuum furnaces, including, Tungsten Heater/WireTungsten ChucksTungsten Support Components, Tungsten Heater Birdcage Shape, Molybdenum Chucks, Molybdenum Heavy HammersMolybdenum Guide Shells, etc.

Tungsten (W) Heater for MOCVD

Tungsten (W) Heater Processing Accuracy Parameters

Main Materials

Processing

Range

Dimensional Accuracy

(mm)

Shape Accuracy 

(mm)

Position Accuracy (mm)

Finish

(Ra, μm)

HM-W (≥99.95%)

 

0.00-5.00

±0.003

0.01

0.005

0.2-0.4

5.01-15.00

±0.005

0.015

0.006

0.4

15.01-30

±0.008

0.02

0.007

0.4

30.01-100

±0.010

0.025

0.008

0.6

>100

±0.0127

0.030

0.010

0.6

Tungsten (W) Heater Applications

  • Used in the epitaxial growth of semiconductor materials.
  • Used in the deposition of ultra-thin films on substrates.
  • Used in the doping process.
  • Used in the growth of III-V compound semiconductors like gallium arsenide (GaAs), indium phosphide (InP), and gallium nitride (GaN).

Tungsten (W) Heater Packing

The Tungsten (W) Heater will be tagged and labeled externally to ensure efficient identification and quality control. Great care will be taken to avoid any damage caused during storage or transportation. They will be packed in a carton or wooden case supported with soft materials to ensure the products will not shift inside the cases.

Tungsten (W) Heater for MOCVD Packing

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