Viewed products

Tungsten

Sale! Tungsten (W) Heater for MOCVD View larger

Tungsten (W) Heater for MOCVD

HTWW1142

New product

Tungsten (W) Heater for MOCVD is a metal resistance heating element used for the metal-organic chemical vapor deposition (MOCVD) process. Heeger Materials can provide top-quality Tungsten (W) Heater at competitive prices, with customized options for shapes and dimensions to meet specific requirements.

More details

Inquiry

Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Secure payment methods

Data sheet

MaterialsTungsten (W)
Purity99.95%

More info

Tungsten (W) Heater for MOCVD can uniformly heat the substrate under high temperature, high pressure, and high gas flow conditions, promoting the growth of thin film materials.

HM is a leading supplier of high-quality Tungsten and Molybdenum parts for high-temperature and vacuum furnaces, including, Tungsten Heater/WireTungsten ChucksTungsten Support Components, Tungsten Heater Birdcage Shape, Molybdenum Chucks, Molybdenum Heavy HammersMolybdenum Guide Shells, etc.

Tungsten (W) Heater for MOCVD

Tungsten (W) Heater for MOCVD Selection Notes

Tungsten (W) Heater for MOCVD belongs to the tungsten products range and is selected for very high melting point, density, hardness and strength at elevated temperature. It is commonly used in project-specific assemblies, prototypes, replacement parts and drawing-based ceramic components as well as furnace components, shielding, electrodes, evaporation systems, aerospace parts and precision tooling. When requesting a quote, confirm drawings, dimensions, tolerances, material grade, surface finish, quantity and working environment.

Related Materials and Product Forms

For material comparison or adjacent product forms, browse tungsten rods, tungsten plates, molybdenum products and tungsten products.

FAQ

Can Tungsten (W) Heater for MOCVD be customized? Yes. Heeger Materials can review custom sizes, purity or grade requirements, tolerances, drawings, quantities and application conditions for this product.

Tungsten (W) Heater Processing Accuracy Parameters

Main Materials

Processing

Range

Dimensional Accuracy

(mm)

Shape Accuracy 

(mm)

Position Accuracy (mm)

Finish

(Ra, μm)

HM-W (≥99.95%)

 

0.00-5.00

±0.003

0.01

0.005

0.2-0.4

5.01-15.00

±0.005

0.015

0.006

0.4

15.01-30

±0.008

0.02

0.007

0.4

30.01-100

±0.010

0.025

0.008

0.6

>100

±0.0127

0.030

0.010

0.6

Tungsten (W) Heater Applications

  • Used in the epitaxial growth of semiconductor materials.
  • Used in the deposition of ultra-thin films on substrates.
  • Used in the doping process.
  • Used in the growth of III-V compound semiconductors like gallium arsenide (GaAs), indium phosphide (InP), and gallium nitride (GaN).

Tungsten (W) Heater Packing

The Tungsten (W) Heater will be tagged and labeled externally to ensure efficient identification and quality control. Great care will be taken to avoid any damage caused during storage or transportation. They will be packed in a carton or wooden case supported with soft materials to ensure the products will not shift inside the cases.

Tungsten (W) Heater Packing

Inquiry to Heeger Materials

Items marked with an asterisk (*) are required.
Please include item quantity, size and purity.
Privacy Information:

Heeger Materials respects your privacy, and we will NOT sell or provide your personal data to other third parties, or allow them to use your personal data for their own purposes. However, we would like to send you information from time to time by mail or email about our products and special offers in addition to the interest categories you've selected above. Read our Privacy Policy

30 other products in the same category:

Download