Tungsten (W) Heater for MOCVD can uniformly heat the substrate under high temperature, high pressure, and high gas flow conditions, promoting the growth of thin film materials.

HM is a leading supplier of high-quality Tungsten and Molybdenum parts for high-temperature and vacuum furnaces, including, Tungsten Heater/Wire, Tungsten Chucks, Tungsten Support Components, Tungsten Heater Birdcage Shape, Molybdenum Chucks, Molybdenum Heavy Hammers, Molybdenum Guide Shells, etc.

Tungsten (W) Heater Processing Accuracy Parameters

Tungsten (W) Heater Applications

• Used in the epitaxial growth of semiconductor materials.
• Used in the deposition of ultra-thin films on substrates.
• Used in the doping process.
• Used in the growth of III-V compound semiconductors like gallium arsenide (GaAs), indium phosphide (InP), and gallium nitride (GaN).

Tungsten (W) Heater Packing

The Tungsten (W) Heater will be tagged and labeled externally to ensure efficient identification and quality control. Great care will be taken to avoid any damage caused during storage or transportation. They will be packed in a carton or wooden case supported with soft materials to ensure the products will not shift inside the cases.