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Arsenic (As) Sputtering Targets

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Arsenic Target is often used for manufacturing cemented carbide and Arsenic compounds. Heeger Materials specializes in producing high purity Arsenic and Arsenide materials to meet the individual specifications and requested compositions of the Arsenic market. 

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Data sheet

Molecular FormulaAs
Purity99.999% - 99.99999%

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Arsenic Targets are materials used for physical vapor deposition or sputtering deposition, composed of arsenic elements. HM provides high-quality Arsenic targets at a competitive price, which can be used in Scientific research or industrial production.

Arsenide includes Gallium arsenide, high-purity Arsenic, Arsenic granules, and Arsenic lumps.

Arsenic (As) Sputtering Targets

  • Molecular Formula: As, Ga
  • CAS No.: 7440-38-2
  • EINECS No.:  231-148-6
  • Purity: 99.999% min
  • Size: 1-20mm
  • Melting Point: 817℃
  • Boiling Point: 613 ℃
  • Density: 5.72 g/cm3

Arsenic (As) Sputtering Targets Properties

  • High purity
  • Evaporability
  • Good sputtering capability
  • Excellent semiconductor properties
  • Good thermal stability
  • Good chemical stability

Arsenic (As) Sputtering Targets Applications

  • Used for manufacturing cemented carbide and Arsenic compounds
  • Used to prepare compound semiconductor materials such as gallium arsenide (GaAs).
  • Used to fabricate optical films such as anti-reflection coatings, infrared-transmitting films, and optical filters.
  • Used to prepare gallium indium arsenide (GaInAs), which is an important magnetic material applied in magnetic storage devices and magnetic sensors.

Arsenic (As) Sputtering Targets Packing

Selenide Targets should be securely sealed in a plastic bag and placed outside with either a carton or a bucket for storage and shipping. 

Why choose us?

● Uniform size, 99.999% purity, 
● Stable quality, no defects, 
● Different sizes and shapes can be customized.

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