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Semiconductor Materials

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ITO Target

HTHP663

New product

Heeger Materials offers a selection of over 100 high purity products, including metals, metal oxides and metal salts, with 99.999% purity or higher. We can provide ITO sputtering target with the purity of 99.99%, 99.999%,99.9999% and 99.99999% in size of ingot, lump and powder.

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Data sheet

SymbolITO target
Purity99.999% (5N)
Sizeround/planary/target
ProductITO target
CASNA

More info

High-purity and ultra-high purity ITO sputtering targets are crucial components for the research, development, and production of advanced technologies which require optimum properties, performance, and quality.

ITO

Usage:

It is crucial a component for the research, development, and production of advanced technologies.

Packing:

It is packed with dacron film, then covered with a sealed plastic film bag or in a polyethylene bottle.

ITO Target Selection Notes

ITO Target belongs to the transparent conductive oxide material range and is selected for controlled material quality, application-specific specifications and reliable supply for research or production use. It is commonly used in transparent conductive films, display coatings, photovoltaic layers, sensor devices, thin-film deposition and electronic material research. When requesting a quote, confirm oxide composition, dopant ratio, purity, form, target dimensions or powder size, density, bonding requirement, packaging and quantity.

Related Materials and Product Forms

For material comparison or adjacent product forms, browse all products, deposition materials, technical ceramics and Semiconductor Materials.

FAQ

What transparent conductive oxide details are useful? Please provide oxide composition, dopant ratio, purity, form, target size or powder size, density or bonding needs, packaging and intended coating or device application.

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