WTaZrHf Allloy Spherical Powder

WTaZrHf Alloy Spherical Powder is a refractory multi-element alloy composed primarily of tantalum (Ta), tungsten (W), hafnium (Hf), and zirconium (Zr), with typical compositions like Ta-10W-2.5Hf-0.1Zr-0.1Nb-0.02Mo (such as T-122 alloy). This powder exhibits high sphericity, excellent flowability, controllable particle size distribution, and high purity with low oxygen content. It offers outstanding properties, including high melting point, thermal stability, mechanical strength, plasticity, corrosion resistance, biocompatibility, low density, and high specific strength. It is widely used in additive manufacturing (3D printing), powder metallurgy, and hot isostatic pressing (HIP), and serves critical roles in aerospace, energy and nuclear sectors, electronics, advanced manufacturing, and biomedical applications. Heeger Materials provides high-quality WTaZrHf Alloy Spherical Powder with consistent performance for advanced manufacturing needs.

WTaZrHf Allloy Spherical Powder Selection Notes

WTaZrHf Allloy Spherical Powder belongs to the tantalum products range and is selected for corrosion resistance, biocompatibility and high-temperature stability. It is commonly used in formulation, sintering, coating, filler, catalyst, electronic material and research use as well as chemical processing, medical devices, electronics, vacuum systems and high-temperature components. When requesting a quote, confirm purity, particle size distribution, morphology, surface treatment, packaging and quantity.

Related Materials and Product Forms

For material comparison or adjacent product forms, browse tantalum plates, tantalum wire, refractory metals and tantalum products.

FAQ

Which powder specifications are needed for a quote? Please provide purity, particle size distribution, morphology, surface treatment, packaging, quantity and the intended process such as sintering, coating, filler use or research.

WTaZrHf Alloy Powder Chemical Composition and Gas Impurities

Element	Value (%)	Element	Value (%)
Ta	Balance	O	0.049
W	6.17	C	0.01
Hf	12.01	N	0.013
Zr	21.38	H	0.0012

WTaZrHf Alloy Spherical Powder Density and Flow Rate

Property	Value	Unit
Apparent Density	8.333	g/cm³
Tap Density	7.8125	g/cm³
Hall Flow Rate	7.58	s/50g

WTaZrHf Alloy Spherical Powder Optical Microscope Photograph

WTaZrHf Alloy Spherical Powder Key Features

• High Melting Point and Thermal Stability: With a melting point reaching 3027 °C, the alloy maintains excellent thermal stability and creep resistance across a wide temperature range (93–1426 °C), far exceeding that of conventional high-temperature alloys.
• High Strength and Ductility: At room temperature, it exhibits a tensile strength of 773 MPa and an elongation of 30%, delivering both mechanical strength and formability for complex structural components.
• Corrosion Resistance and Biocompatibility: The dense Ta₂O₅ oxide layer on the surface of tantalum ensures exceptional chemical inertness in acidic, alkaline, and physiological environments, while also offering excellent compatibility with human tissue, making it suitable for biomedical implants.
• Low Density and High Specific Strength: With a density of 16.79 g/cm³—significantly lower than pure tungsten (19.3 g/cm³)—the alloy offers a notable weight advantage in aerospace lightweight design applications.

WTaZrHf Alloy Spherical Powder Applications

• Aerospace and Defense: With exceptional heat and corrosion resistance, the alloy is ideal for rocket engine chambers, nozzles, and components exposed to extreme combustion environments, enduring temperatures above 3000 °C and oxidizing/methane-based propellants.
• Biomedical Applications: Thanks to its biocompatibility and corrosion resistance, the alloy is suitable for orthopedic implants and dental restorations. 3D-printed porous structures exhibit an elastic modulus close to that of cartilage (10–20 GPa), promoting osseointegration and long-term implant stability.
• Energy and Nuclear Industry: The presence of Zr and Hf with low neutron capture cross-sections makes the alloy suitable for nuclear reactor cladding materials and fusion reactor first walls, offering long-term performance in high-temperature, high-radiation environments.
• Electronics and Advanced Manufacturing: Used as sputtering targets in semiconductor fabrication and high-temperature sensors, the alloy supports precise thin-film deposition and sensor stability in environments exceeding 2000 °C.